Simple methods for site-controlled carbon nanotube growth using radio-frequency plasma-enhanced chemical vapor deposition

被引：12

作者：

Jeong, GH ^{[1
]}

Satake, N

Kato, T

Hirata, T

Hatakeyama, R

Tohji, K

机构：

[1] Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, Japan

[2] Tohoku Univ, Dept Geosci & Technol, Sendai, Miyagi 9808579, Japan

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2004年 / 79卷 / 01期

关键词：

D O I：

10.1007/s00339-004-2599-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We demonstrate the validity of very simple methods for site-controlled carbon nanotube growth using a radio-frequency magnetron-type plasma-enhanced chemical vapor deposition technique. Enhanced plasma density and optimized ion-bombardment energy achieved by magnetic field introduction are found to be responsible for the uniform and well-aligned carbon nanotube growth. Based on these results, we attempted to perform experiments on site-controlled carbon nanotube growth using very convenient methods such as scratching or simply masking a substrate surface where carbonaceous materials deposit.

引用

页码：85 / 87

页数：3

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