Metal Contacts on Physical Vapor Deposited Monolayer MoS

被引:291
作者
Gong, Cheng [1 ]
Huang, Chunming [2 ]
Miller, Justin [1 ]
Cheng, Lanxia [1 ]
Hao, Yufeng [3 ,4 ]
Cobden, David [2 ]
Kim, Jiyoung [1 ]
Ruoff, Rodney S. [3 ,4 ]
Wallace, Robert M. [1 ]
Cho, Kyeongjae [1 ]
Xu, Xiaodong [2 ]
Chabal, Yves J. [1 ]
机构
[1] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75080 USA
[2] Univ Washington, Dept Phys, Seattle, WA 98195 USA
[3] Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
[4] Univ Texas Austin, Mat Sci & Engn Program, Austin, TX 78712 USA
基金
美国国家科学基金会;
关键词
molybdenum disulfide; metal contact; homogeneity; atomic force microscopy; Raman spectroscopy; graphene; buffer layer; WORK FUNCTION; GRAPHENE; GROWTH; ENERGY;
D O I
10.1021/nn4052138
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The understanding of the metal and transition metal dichalcogenide (TMD) interface is critical for future electronic device technologies based on this new class of two-dimensional semiconductors. Here, we investigate the initial growth of nanometer-thick Pd, Au, and Ag films on monolayer MoS2. Distinct growth morphologies are identified by atomic force microscopy: Pd forms a uniform contact, Au clusters into nanostructures, and Ag forms randomly distributed islands on MoS2. The formation of these different interfaces is elucidated by large-scale spin-polarized density functional theory calculations. Using Raman spectroscopy, we find that the interface homogeneity shows characteristic Raman shifts in E-2g(1) and A(1g) modes. Interestingly, we show that insertion of graphene between metal and MoS2 can effectively decouple MoS2 from the perturbations imparted by metal contacts (e.g., strain), while maintaining an effective electronic coupling between metal contact and MoS2, suggesting that graphene can act as a conductive buffer layer in TMD electronics.
引用
收藏
页码:11350 / 11357
页数:8
相关论文
共 36 条
[1]   PROJECTOR AUGMENTED-WAVE METHOD [J].
BLOCHL, PE .
PHYSICAL REVIEW B, 1994, 50 (24) :17953-17979
[2]   Field-Effect Tunneling Transistor Based on Vertical Graphene Heterostructures [J].
Britnell, L. ;
Gorbachev, R. V. ;
Jalil, R. ;
Belle, B. D. ;
Schedin, F. ;
Mishchenko, A. ;
Georgiou, T. ;
Katsnelson, M. I. ;
Eaves, L. ;
Morozov, S. V. ;
Peres, N. M. R. ;
Leist, J. ;
Geim, A. K. ;
Novoselov, K. S. ;
Ponomarenko, L. A. .
SCIENCE, 2012, 335 (6071) :947-950
[3]   Tuning the Electronic and Chemical Properties of Monolayer MoS2 Adsorbed on Transition Metal Substrates [J].
Chen, Wei ;
Santos, Elton J. G. ;
Zhu, Wenguang ;
Kaxiras, Efthimios ;
Zhang, Zhenyu .
NANO LETTERS, 2013, 13 (02) :509-514
[4]   Bandgap Engineering of Strained Monolayer and Bilayer MoS2 [J].
Conley, Hiram J. ;
Wang, Bin ;
Ziegler, Jed I. ;
Haglund, Richard F., Jr. ;
Pantelides, Sokrates T. ;
Bolotin, Kirill I. .
NANO LETTERS, 2013, 13 (08) :3626-3630
[5]   High Performance Multilayer MoS2 Transistors with Scandium Contacts [J].
Das, Saptarshi ;
Chen, Hong-Yan ;
Penumatcha, Ashish Verma ;
Appenzeller, Joerg .
NANO LETTERS, 2013, 13 (01) :100-105
[6]  
Elias DC, 2011, NAT PHYS, V7, P701, DOI [10.1038/nphys2049, 10.1038/NPHYS2049]
[7]  
Fuhrer MS, 2013, NAT NANOTECHNOL, V8, P146, DOI 10.1038/nnano.2013.30
[8]  
Gong C., NANO LETT UNPUB
[9]   Rapid Selective Etching of PMMA Residues from Transferred Graphene by Carbon Dioxide [J].
Gong, Cheng ;
Floresca, Herman Carlo ;
Hinojos, David ;
McDonnell, Stephen ;
Qin, Xiaoye ;
Hao, Yufeng ;
Jandhyala, Srikar ;
Mordi, Greg ;
Kim, Jiyoung ;
Colombo, Luigi ;
Ruoff, Rodney S. ;
Kim, Moon J. ;
Cho, Kyeongjae ;
Wallace, Robert M. ;
Chabal, Yves J. .
JOURNAL OF PHYSICAL CHEMISTRY C, 2013, 117 (44) :23000-23008
[10]   Band alignment of two-dimensional transition metal dichalcogenides: Application in tunnel field effect transistors [J].
Gong, Cheng ;
Zhang, Hengji ;
Wang, Weihua ;
Colombo, Luigi ;
Wallace, Robert M. ;
Cho, Kyeongjae .
APPLIED PHYSICS LETTERS, 2013, 103 (05)