High Performance Multilayer MoS2 Transistors with Scandium Contacts

被引:2118
作者
Das, Saptarshi [1 ]
Chen, Hong-Yan
Penumatcha, Ashish Verma
Appenzeller, Joerg
机构
[1] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
基金
美国国家科学基金会;
关键词
2-d semiconductor; layered dichalcogenide; MoS2; field-effect transistor (FET); contact; mobility; INTEGRATED-CIRCUITS; MOBILITY;
D O I
10.1021/nl303583v
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
While there has been growing interest in two-dimensional (2-D) crystals other than graphene, evaluating their potential usefulness for electronic applications is still in its infancy due to the lack of a complete picture of their performance potential. The focus of this article is on contacts. We demonstrate that through a proper understanding and design of source/drain contacts and the right choice of number of MoS2 layers the excellent intrinsic properties of this 2-D material can be harvested. Using scandium contacts on 10-nm-thick exfoliated MoS2 flakes that are covered by a 15 nm Al2O3 film, high effective mobilities of 700 cm(2)/(V s) room temperature. This breakthrough is largely attributed to the fact that we succeeded in eliminating contact resistance effects that limited the device performance in the past unrecognized. In fact, the apparent linear dependence of current on drain voltage had mislead researchers to believe that a truly Ohmic contact had already been achieved, a misconception that we also elucidate in the present article.
引用
收藏
页码:100 / 105
页数:6
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