Low Z total reflection X-ray fluorescence analysis - challenges and answers

被引:34
作者
Streli, C [1 ]
Kregsamer, P
Wobrauschek, P
Gatterbauer, H
Pianetta, P
Pahlke, S
Fabry, L
Palmetshofer, L
Schmeling, M
机构
[1] Osterreich Univ, Atominst, A-1020 Vienna, Austria
[2] Stanford Synchrotron Radiat Lab, Stanford, CA 94309 USA
[3] Wacker Siltron, Burghausen, Germany
[4] Univ Linz, Inst Halbleiter & Festkorperphys, A-4040 Linz, Austria
[5] Princeton Univ, Dept Chem Engn, Princeton, NJ 08544 USA
基金
奥地利科学基金会;
关键词
total reflection X-ray fluorescence analysis; TXRF; energy dispersive X-ray fluorescence analysis; EDXRF; synchrotron radiation; low-Z elements;
D O I
10.1016/S0584-8547(99)00069-5
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Low Z elements, like C, O,... Al are difficult to measure, due to the lack of suitable low-energy photons for efficient excitation using standard X-ray tubes, as well as difficult to detect with an energy dispersive detector, if the entrance window is not thin enough. Special excitation sources and special energy dispersive detectors are required to increase the sensitivity and to increase the detected fluorescence signal and so to improve the detection limits. Synchrotron radiation, due to its features like high intensity and wide spectral range covering also the low-energy region, is the ideal source for TXRF, especially of low-Z elements. Experiments at a specific beamline (BL 3-4) at SSRL, Stanford, designed for the exclusive use of low-energy photons has been used as an excitation source. Detection limits < 100 fg for Al, Mg and Na have been achieved using quasimonochromatic radiation of 1.7 keV. A Ge(HP) detector with an ultra-thin NORWAR entrance window is used. One application is the determination of low-Z surface contamination on Si-wafers. Sodium, as well as Al, are elements of interest for the semiconductor industry, both influencing the yield of ICs negatively. A detection capacity of 10(10) atoms/cm(2) is required which can be reached using synchrotron radiation as excitation source. Another promising application is the determination of low-Z atoms implanted in Si wafers. Sodium, Mg and Al were implanted in Si-wafers at various depths. From measuring the dependence of the fluorescence signal on the glancing angle, characteristic shapes corresponding to the depth profile and the relevant implantation depth are found. Calculations are compared with measurements. Finally, aerosols sampled on polycarbonate plates in a Battelle impactor were analyzed with LZ-TXRF using multilayer monochromatized Cr-K alpha radiation from a 1300-W fine-focus tube for excitation. Results are presented. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1433 / 1441
页数:9
相关论文
共 15 条
[1]  
DEBOER, 1994, APPL PHYS A, V58, P169
[2]   CALCULATION OF X-RAY-FLUORESCENCE INTENSITIES FROM BULK AND MULTILAYER SAMPLES [J].
DEBOER, DKG .
X-RAY SPECTROMETRY, 1990, 19 (03) :145-154
[3]   TOTAL REFLECTION X-RAY-FLUORESCENCE OF SINGLE AND MULTIPLE THIN-LAYER SAMPLES [J].
DEBOER, DKG ;
VANDENHOOGENHOF, WW .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1991, 46 (10) :1323-1331
[4]  
FABRY L, 1996, 6 C TXRF REL METH 10
[5]  
FABRY L, 1996, IEEE T SEMICONDUCT M, V9, P1
[6]  
*IAEA, 1997, QXAS V3 5
[7]   TOTAL REFLECTION X-RAY-FLUORESCENCE SPECTROMETRY FOR SURFACE-ANALYSIS [J].
KNOTH, J ;
SCHWENKE, H ;
WEISBROD, U .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1989, 44 (05) :477-481
[8]  
KREGSAMER P, 1999, IN PRESS XRAY SPECTR
[9]   SYNCHROTRON-BASED X-RAY-LITHOGRAPHY AT STANFORD-UNIVERSITY [J].
PAN, L ;
KING, PL ;
PIANETTA, P ;
SELIGSON, D ;
BARBEE, TW .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1988, 266 (1-3) :287-292
[10]   TOTAL-REFLECTION X-RAY-FLUORESCENCE ANALYSIS OF LIGHT-ELEMENTS UNDER VARIOUS EXCITATION CONDITIONS [J].
STRELI, C ;
WOBRAUSCHEK, P ;
LADISICH, W ;
REIDER, R ;
AIGINGER, H .
X-RAY SPECTROMETRY, 1995, 24 (03) :137-142