Quantum wires and dots for optical studies

被引:6
作者
Forchel, A
Ils, P
Wang, KH
Schilling, O
Steffen, R
Oshinowo, J
机构
[1] Technische Physik, Universität Würzburg, D-97074 Würzburg, Am Hubland
[2] University of New York, Albany, NY
[3] State University of New York, Albany, NY
关键词
quantum wires; quantum dots; electron beam lithography; optical spectroscopy;
D O I
10.1016/0167-9317(95)00370-3
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
InGaAs/InP quantum wires with widths down to 10 nm and dots with diameters down to 16 nm have been realized by electron beam lithography and wet chemical etching. Compared to previously investigated dry etching processes optically inactive sidewall layers can be avoided. The luminescence spectra of the quantum wires and dots show band edge shifts of up to about 80 meV due to the lateral quantization. Under high optical excitation several lateral states are populated. The lateral size dependence of the transition energies can be modelled quite accurately based on the measured sizes of the nanostructures. From the increase of the luminescence linewidths at low excitation in narrow quantum wires the typical size fluctuations in our structures are estimated to be on the order of +/- 2 nm.
引用
收藏
页码:317 / 330
页数:14
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