Substrate effects in monolithic RF transformers on silicon

被引:149
作者
Ng, KT [1 ]
Rejaei, B [1 ]
Burghartz, JN [1 ]
机构
[1] Delft Univ Technol, Delft Inst Microelect & Submicron Technol, Microwave Components Grp, Lab Elect Components Technol & Mat, NL-2628 CT Delft, Netherlands
关键词
Eddy-current losses; etching; ground shield; integrated transformer; maximum available gain; mutual coupling; periodic ground pattern; quality factor; substrate effect; substrate transfer;
D O I
10.1109/22.981289
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effect of substrate RF losses on the characteristics of silicon-based integrated transformers is studied experimentally by, using a substrate transfer technique. The maximum available gain is used to evaluate the quality of transformers similarly to that of active devices. The silicon substrate has a pronounced effect on the quality factor and mutual resistive coupling factor of the primary and secondary coils, thereby degrading the maximum available gain of the transformer. A highly structured patterned ground shield is shown to improve the maximum available gain of a transformer at high frequencies, while at low frequencies, it has little effect on the maximum available gain and even degrades the quality factors of the transformer coils. It is shown that the low-frequency degradation of the coil quality factors relates to local eddy currents in the patterned metal shield.
引用
收藏
页码:377 / 383
页数:7
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