Metastable oxygen-silicon interstitial complex in crystalline silicon

被引:22
作者
Abdullin, KA
Mukashev, BN
Gorelkinskii, YV
机构
[1] Physical-Technical Institute, Kazakstan Academy of Sciences
关键词
D O I
10.1088/0268-1242/11/11/010
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new metastable complex in monocrystalline silicon irradiated at similar to 80 K with protons has been studied. Electron paramagnetic resonance (EPR) Si-AA13 (C-3V symmetry) and Si-AA14 (C-1 symmetry) spectra as well as the known Si-A18 spectrum originate from different molecular configurations of the complex. A complete conversion between the metastable configurations is achieved by thermal annealing at similar to 190 K (A18 --> AA13) and by prolonged illumination with bandgap light at 77 K (AA13 --> AA14 --> A18). Deep electron levels of the complex have been established. Preferential stress-induced alignment of the interstitial oxygen at 450 degrees C in as-grown samples (before irradiation) as well as the AA13 defect alignment at less than or equal to 200 K (after irradiation) have unambiguously indicated that interstitial oxygen is involved in the structure of the centre. A tentative model of the defect is a self-interstitial-oxygen-interstitial complex. A new self-interstitial-related centre (labelled AA12) was also observed after annealing of the oxygen-related metastable complex.
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收藏
页码:1696 / 1703
页数:8
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