Auger electron spectroscopy studies of nitridation of the GaAs(001) surface

被引:16
作者
Aksenov, I
Nakada, Y
Okumura, H
机构
[1] JRCAT, Angstrom Technol Partnership ATP, Ibaraki 305, Japan
[2] Mitsubishi Mat Corp, Cent Res Inst, Omiya, Saitama 330, Japan
[3] Electrotech Lab, Ibaraki 305, Japan
关键词
D O I
10.1063/1.368513
中图分类号
O59 [应用物理学];
学科分类号
摘要
Auger electron spectroscopy has been used to investigate the processes taking place during the initial stages of nitridation of the As-stabilized GaAs(001)-2 x 4 surface by active nitrogen species generated by a radio-frequency plasma source. The results of analysis of the spectral shape of core-level Auger electron signals from Ga, As, and N, as well as dependencies of the intensities of those signals on the duration of nitridation combined with reflection high-energy electron diffraction results show that nitridation occurs in two distinct steps: the first step (with duration of only a few minutes) being the formation of 1 ML of nitrogen (partially mixed with arsenic) on the surface, and the second stage being the formation of the disordered GaAsN phase, which may be the GaAsxN1-x surface phase. The subsequent thermal annealing for several minutes at 600 degrees C leads to the desorption of arsenic and the resulting crystallization of the GaAsN phase into a cubic GaN layer of about 20 Angstrom thickness. (C) 1998 American Institute of Physics.
引用
收藏
页码:3159 / 3166
页数:8
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