Hydrogen detection in CVD diamond films by elastic recoil detection analysis

被引:23
作者
Kimura, A [1 ]
Nakatani, Y [1 ]
Yamada, K [1 ]
Suzuki, T [1 ]
机构
[1] Keio Univ, Dept Mech Engn, Kohoku Ku, Yokohama, Kanagawa 223, Japan
关键词
ERDA; hydrogen; surface roughness; thick films;
D O I
10.1016/S0925-9635(98)00322-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The hydrogen concentration in diamond films deposited by the microwave plasma CVD method was evaluated by elastic recoil detection analysis (ERDA) using He ion beam. Diamond films with similar to 500 mu m thickness were peeled off Si substrates and the hydrogen concentration was measured for both growth surface and backside. The hydrogen concentration of the growth surface was approximately 1.9% against the number of carbon atoms, while that of the backside was 6.5%. By grinding both surfaces, the hydrogen concentration of the growth surface became approximately 2.6%, and that of the backside 4.2%. These results show that the hydrogen measurement by ERDA depends strongly on the surface roughness. In this paper, we also discuss the growth mechanism at the initial stage of diamond deposition, comparing the hydrogen concentration of the growth surface and backside of films. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:37 / 41
页数:5
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