Self-assembling of Ge quantum dots in an alumina matrix

被引:29
作者
Buljan, M. [1 ]
Pinto, S. R. C. [2 ,3 ]
Rolo, A. G. [2 ,3 ]
Martin-Sanchez, J. [2 ,3 ]
Gomes, M. J. M. [2 ,3 ]
Grenzer, J. [4 ]
Muecklich, A. [4 ]
Bernstorff, S. [5 ]
Holy, V. [6 ]
机构
[1] Rudjer Boskovic Inst, Zagreb 10000, Croatia
[2] Univ Minho, Ctr Phys, P-4710057 Braga, Portugal
[3] Univ Minho, Dept Phys, P-4710057 Braga, Portugal
[4] Forschungszentrum Dresden Rossendorf EV, D-01314 Dresden, Germany
[5] Sincrotrone Trieste, I-34012 Basovizza, Italy
[6] Charles Univ Prague, Prague 12116, Czech Republic
来源
PHYSICAL REVIEW B | 2010年 / 82卷 / 23期
关键词
NANOCRYSTALS; NANOSTRUCTURES; SILICON; E(1);
D O I
10.1103/PhysRevB.82.235407
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work we report on a self-assembled growth of a Ge quantum dot lattice in a single 600-nm-thick Ge+Al(2)O(3) layer during magnetron sputtering deposition of a Ge+Al(2)O(3) mixture at an elevated substrate temperature. The self-assembly results in the formation of a well-ordered three-dimensional body-centered tetragonal quantum dot lattice within the whole deposited volume. The quantum dots formed are very small in size (less than 4.0 nm), have a narrow size distribution and a large packing density. The parameters of the quantum dot lattice can be tuned by changing the deposition parameters. The self-ordering of the quantum dots is explained by diffusion-mediated nucleation and surface-morphology effects and simulated by a kinetic Monte Carlo model.
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页数:7
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