Evidence of light-emitting amorphous silicon clusters confined in a silicon oxide matrix

被引:115
作者
Rinnert, H
Vergnat, M
Burneau, A
机构
[1] Univ Nancy 1, Phys Mat Lab, CNRS, UMR 7556, F-54506 Vandoeuvre Les Nancy, France
[2] Univ Nancy 1, Chim Phys Environm Lab, CNRS, UMR 7564, F-54506 Villers Les Nancy, France
关键词
D O I
10.1063/1.1330557
中图分类号
O59 [应用物理学];
学科分类号
摘要
Amorphous silicon oxide thin films were prepared by the coevaporation technique in ultrahigh vacuum. Different compositions were obtained by changing the evaporation rate of silicon. The samples were then annealed to different temperatures up to 950 degreesC. The composition and the structure were investigated using energy dispersive x-ray spectroscopy, infrared absorption measurements, and Raman spectroscopy. This study attests the presence of amorphous silicon clusters in a silicon oxide matrix. Optical transmission measurements were performed and interpreted in the field of the composite medium theory. The obtained results are in good agreement with the presented structural model. The photoluminescence in the red-orange domain was studied in relation with the structure. The correlation between the photoluminescence energy and intensity and the structure shows that the light emission originates from the silicon clusters embedded in the silicon oxide matrix. Moreover the dependence of the photoluminescence energy with the silicon volume fraction suggests the origin of the light emission could be due to a quantum confinement effect of carriers in the amorphous silicon clusters. (C) 2001 American Institute of Physics.
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页码:237 / 243
页数:7
相关论文
共 45 条
[1]   Electronic structure of amorphous silicon nanoclusters [J].
Allan, G ;
Delerue, C ;
Lannoo, M .
PHYSICAL REVIEW LETTERS, 1997, 78 (16) :3161-3164
[2]   THE ORIGIN OF VISIBLE LUMINESCENCE FROM POROUS SILICON - A NEW INTERPRETATION [J].
BRANDT, MS ;
FUCHS, HD ;
STUTZMANN, M ;
WEBER, J ;
CARDONA, M .
SOLID STATE COMMUNICATIONS, 1992, 81 (04) :307-312
[3]   SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS [J].
CANHAM, LT .
APPLIED PHYSICS LETTERS, 1990, 57 (10) :1046-1048
[4]   Spectroscopic ellipsometry analyses of sputtered Si/SiO2 nanostructures [J].
Charvet, S ;
Madelon, R ;
Gourbilleau, F ;
Rizk, R .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (08) :4032-4039
[5]   The photoluminescence in Si+-implanted SiO2 films with rapid thermal anneal [J].
Chou, ST ;
Tsai, JH ;
Sheu, BC .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (10) :5394-5398
[6]   The structural and luminescence properties of porous silicon [J].
Cullis, AG ;
Canham, LT ;
Calcott, PDJ .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (03) :909-965
[7]   THEORETICAL ASPECTS OF THE LUMINESCENCE OF POROUS SILICON [J].
DELERUE, C ;
ALLAN, G ;
LANNOO, M .
PHYSICAL REVIEW B, 1993, 48 (15) :11024-11036
[8]   SIZE DEPENDENCE OF BAND-GAPS IN SILICON NANOSTRUCTURES [J].
DELLEY, B ;
STEIGMEIER, EF .
APPLIED PHYSICS LETTERS, 1995, 67 (16) :2370-2372
[9]   Visible luminescence from nanocrystalline silicon films produced by plasma enhanced chemical vapor deposition [J].
Edelberg, E ;
Bergh, S ;
Naone, R ;
Hall, M ;
Aydil, ES .
APPLIED PHYSICS LETTERS, 1996, 68 (10) :1415-1417
[10]   Photoluminescence and resonant Raman spectra of silicon films produced by size-selected cluster beam deposition [J].
Ehbrecht, M ;
Kohn, B ;
Huisken, F ;
Laguna, MA ;
Paillard, V .
PHYSICAL REVIEW B, 1997, 56 (11) :6958-6964