Subsurface dimerization in III-V semiconductor (001) surfaces

被引:111
作者
Kumpf, C
Marks, LD
Ellis, D
Smilgies, D
Landemark, E
Nielsen, M
Feidenhans, R
Zegenhagen, J
Bunk, O
Zeysing, JH
Su, Y
Johnson, RL
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
[3] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[4] Univ Hamburg, Inst Expt Phys 2, D-22761 Hamburg, Germany
[5] Riso Natl Lab, Condensed Matter Phys & Chem Dept, DK-4000 Roskilde, Denmark
关键词
D O I
10.1103/PhysRevLett.86.3586
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We present the atomic structure of the c(8 X 2) reconstructions of InSb-, InAs-, and GaAs-(001) surfaces as determined by surface x-ray diffraction using direct methods. Contrary to common belief, group III dimers are not prominent on the surface, instead subsurface dimerization of group m atoms takes place in the second bilayer, accompanied by a major rearrangement of the surface atoms above the dimers to form linear arrays. By varying the occupancies of four surface sites the (001)-c(8 X 2) reconstructions of III-V semiconductors can be described in a unified model.
引用
收藏
页码:3586 / 3589
页数:4
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