Local structure around Fe in the diluted magnetic semiconductors Ga1-xFexAs studied by x-ray absorption fine structure -: art. no. 195209

被引:15
作者
Soo, YL
Kioseoglou, G
Huang, S
Kim, S
Kao, YH
Takatani, Y
Haneda, S
Munekata, H [1 ]
机构
[1] Tokyo Inst Technol, Imaging Sci & Engn Lab, Yokohama, Kanagawa 2268503, Japan
[2] SUNY Buffalo, Dept Phys, Amherst, NY 14260 USA
来源
PHYSICAL REVIEW B | 2001年 / 63卷 / 19期
关键词
D O I
10.1103/PhysRevB.63.195209
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Extended x-ray absorption fine structure and near-edge x-ray absorption fine structure techniques are employed to investigate the local structure and valency about Fe atoms in the diluted magnetic alloy semiconductor system Ga1-xFexAs prepared by molecular-beam epitaxy under various conditions. This experiment is aimed at elucidating possible correlations between the microstructures in these diluted magnetic semiconductors and some physical properties. Our x-ray results offer direct evidence of Fe substitution for Ga sites in GaAs prepared at relatively low substrate temperatures, wherein the Ga1-xFexAs compound is mainly paramagnetic. However, the Fe impurity atoms could form small Fe clusters and/or Fe-As complexes when the samples are grown at high temperatures.
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