Water adsorption-desorption on aluminum surface

被引：10

作者：

Chen, JR

Hsiung, GY

Hsu, YJ

Chang, SH

Chen, CH

Lee, WS

Ku, JY

Chan, CK

Joung, LW

Chou, WT

机构：

[1] Synchrotron Radiat Res Ctr, Hsinchu 30077, Taiwan

[2] Natl Tsing Hua Univ, Dept Nucl Sci, Hsinchu, Taiwan

[3] Natl Tsing Hua Univ, Dept Mech Engn, Hsinchu, Taiwan

来源：

APPLIED SURFACE SCIENCE | 2001年 / 169卷

关键词：

adsorption; desorption; aluminum surface;

D O I：

10.1016/S0169-4332(00)00812-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Water adsorption-desorption on aluminum surface studied at the Synchrotron Radiation Research Center (SRRC) is described. Both the thermal desorption and the photon stimulated desorption were studied. It was observed that the outgassing behavior of water is quite different from that of the other gases. Experimental results showed that the processes of venting, evacuation and vacuum treatment are sensitive to the water desorption behavior. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：679 / 684

页数：6

共 9 条

[1] Synchrotron radiation induced H2O desorption from aluminum surfaces [J].

Chen, JR ;

Hsiung, GY ;

Huang, JR ;

Chang, CM ;

Liu, YC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (03) :736-739

[2] OUTGASSING BEHAVIOR ON ALUMINUM SURFACES - WATER IN VACUUM-SYSTEMS [J].

CHEN, JR ;

HUANG, JR ;

HSIUNG, GY ;

WU, TY ;

LIU, YC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04) :1750-1754

[3] THERMAL OUTGASSING FROM ALUMINUM-ALLOY VACUUM CHAMBERS [J].

CHEN, JR ;

NARUSHIMA, K ;

ISHIMARU, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06) :2188-2191

[4] SECONDARY-ION MASS-SPECTROSCOPY ANALYSIS FOR ALUMINUM SURFACES TREATED BY GLOW-DISCHARGE CLEANING [J].

CHEN, JR ;

HSIUNG, GY ;

LIU, YC ;

LEE, WH ;

NEE, CC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03) :562-570

[5] FAST PUMP-DOWN ALUMINUM ULTRAHIGH-VACUUM SYSTEM [J].

ISHIMARU, H ;

ITOH, K ;

ISHIGAKI, T ;

FURUTATE, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (03) :547-552

[6] THERMAL OUTGASSING STUDY ON ALUMINUM SURFACES [J].

LIU, YC ;

HUANG, JR ;

WU, CY ;

CHEN, JR .

VACUUM, 1993, 44 (5-7) :435-437

[7]

TABARES FL, 1998, 14 INT VAC C BIRM 31

[8] QUICK ACQUISITION OF CLEAN ULTRAHIGH-VACUUM BY CHEMICAL PROCESS TECHNOLOGY [J].

TATENUMA, K ;

MOMOSE, T ;

ISHIMARU, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04) :1719-1724

[9]

1994, NIST AVS WORKSH WAT

← 1 →