Reexamination of N composition dependence of coherently grown GaNAs band gap energy with high-resolution x-ray diffraction mapping measurements

被引:234
作者
Uesugi, K [1 ]
Morooka, N [1 ]
Suemune, I [1 ]
机构
[1] Hokkaido Univ, Res Inst Elect Sci, Sapporo, Hokkaido 0600812, Japan
关键词
D O I
10.1063/1.123516
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaNAs films grown on GaAs(001) substrates by metalorganic molecular beam epitaxy were studied by high-resolution x-ray diffraction (XRD) mapping measurements. The lattice constants of epitaxial films are usually estimated from symmetric and asymmetric XRD 2 theta-theta measurements. In this study, it is pointed out that the consideration of the tilt angle between the GaAs(115) and GaNAs(115) planes caused by elastic deformation of the films is crucial to determine the lattice constants of the GaNAs films coherently grown on GaAs substrates. Mapping measurements of (115) XRD (2 theta-theta)-Delta omega were performed for this purpose. The band gap energy of the films was determined by Fourier transform absorption spectroscopy measurements. The band gap energy bowing measured up to the N composition of 4.5% will be discussed by comparing with other measurements and theoretical calculations. (C) 1999 American Institute of Physics. [S0003-6951(99)00809-8].
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页码:1254 / 1256
页数:3
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