Alloying MoS2 with Al and Au:: structure and tribological performance

被引:46
作者
Holbery, JD
Pflueger, E
Savan, A
Gerbig, Y
Luo, Q
Lewis, DB
Munz, WD
机构
[1] CSEM Instruments SA, CH-2007 Neuchatel, Switzerland
[2] CSEM Surface Engn, CH-2007 Neuchatel, Switzerland
[3] Sheffield Hallam Univ, Mat Res Inst, Sheffield S1 1WB, S Yorkshire, England
关键词
MoS2; friction; wear; X-ray diffraction; TEM;
D O I
10.1016/S0257-8972(03)00203-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Mechanical and tribological properties of MoS2 alloyed with Al and Au have been analysed using pin-on-disk. X-ray diffraction (XRD) and TEM to determine the relationship between coating structure and performance. Physical effects by the alloying partner, atomic percentage and variation of deposition parameters on the final behaviour of the coatings are evaluated. XRD and TEM analyses indicate two different structures exist in the MoS2 alloys studied: MoS2-Au alloys deposited from a compound target exhibited periodic distributed particles of 2.5-6 nm while MoS2-Al coatings evolved with a multi-layer architecture. XRD analysis indicates interfacial mixing and roughness present within the individual layers are greatest near 1 mTorr. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:716 / 720
页数:5
相关论文
共 8 条
[1]   PREPARATION AND PROPERTIES OF DIFFERENT TYPES OF SPUTTERED MOS2 FILMS [J].
BUCK, V .
WEAR, 1987, 114 (03) :263-274
[2]   Nanostructural aspects of wear in ion-beam deposited Pb-Mo-S films [J].
Dunn, DN ;
Wahl, KJ ;
Singer, IL .
FUNDAMENTALS OF NANOINDENTATION AND NANOTRIBOLOGY, 1998, 522 :451-456
[3]   CHEMICAL AND STRUCTURAL EFFECTS ON THE LUBRICATION PROPERTIES OF SPUTTERED MOS2 FILMS [J].
FLEISCHAUER, PD ;
BAUER, R .
TRIBOLOGY TRANSACTIONS, 1988, 31 (02) :239-250
[4]  
Lince J. R., 1987, Journal of Materials Research, V2, P827, DOI 10.1557/JMR.1987.0827
[5]   METAL INCORPORATION IN SPUTTER-DEPOSITED MOS2 FILMS STUDIED BY EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE [J].
LINCE, JR ;
HILTON, MR ;
BOMMANNAVAR, AS .
JOURNAL OF MATERIALS RESEARCH, 1995, 10 (08) :2091-2105
[6]   GROWTH MECHANISMS AND NEAR-INTERFACE STRUCTURE IN RELATION TO ORIENTATION OF MOS2 SPUTTERED THIN-FILMS [J].
MOSER, J ;
LEVY, F .
JOURNAL OF MATERIALS RESEARCH, 1992, 7 (03) :734-740
[7]   MORPHOLOGICAL AND FRICTIONAL BEHAVIOR OF SPUTTERED MOS2 FILMS [J].
SPALVINS, T .
THIN SOLID FILMS, 1982, 96 (01) :17-24
[8]   THE EFFECTS OF DOPANTS ON THE CHEMISTRY AND TRIBOLOGY OF SPUTTER-DEPOSITED MOS2 FILMS [J].
ZABINSKI, JS ;
DONLEY, MS ;
WALCK, SD ;
SCHNEIDER, TR ;
MCDEVITT, NT .
TRIBOLOGY TRANSACTIONS, 1995, 38 (04) :894-904