Antireflection of transparent polymers by advanced plasma etching procedures

被引：83

作者：

Schulz, U.

Munzert, P.

Leitel, R.

Wendling, I.

Kaiser, N.

Tuennermann, A.

机构：

[1] Fraunhofer Inst Appl Opt & Precision Engn, D-07745 Jena, Germany

[2] Univ Jena, Inst Phys Appl, D-07743 Jena, Germany

来源：

OPTICS EXPRESS | 2007年 / 15卷 / 20期

关键词：

D O I：

10.1364/OE.15.013108

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Self-organized nanostructures that provide antireflection properties grow on PMMA caused by plasma ion etching. A new procedure uses a thin initial layer prior to the etching step. Different types of antireflective structures can now be produced in a shorter time and with fewer limitations on the type of polymer that can be used. The durability of the structured surfaces can be improved by the deposition of additional thin films. (C) 2007 Optical Society of America.

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页码：13108 / 13113

页数：6

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