Analysis of thickness profiles of pulsed laser deposited metal films

被引:6
作者
Kántor, Z
Szörényi, T
Tóth, Z
Simon, A
Gombos, L
机构
[1] Attila Jozsef Univ, Dept Opt & Quantum Elect, H-6701 Szeged, Hungary
[2] Hungarian Acad Sci, Res Grp Laser Phys, H-6701 Szeged, Hungary
[3] Hungarian Acad Sci, Inst Nucl Res, ATOMKI, H-4001 Debrecen, Hungary
基金
匈牙利科学研究基金会;
关键词
Pulsed laser deposition; PLD; laser beam applications; thin film deposition;
D O I
10.1016/S0169-4332(98)00459-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Practically all theoretical approaches to pulsed laser deposition start on a condition which is extremely hard to realize in practice: that the target surface is smooth and plane. When using liquid (molten) targets, the problem of surface deterioration upon repetitive ablation can completely be solved, allowing for fair comparison of experiment and theory. In this paper measured thickness profiles of metal films deposited in vacuum from molten In, Sn, Bi and Sn-Bi alloy targets are compared with calculated distribution functions. The strictly symmetrical thickness profiles of tin and indium films, derived from two-dimensional optical density maps and Rutherford backscattering data are analysed in terms of Lorentzian-like functions, originating from the so-called shifted Maxwellian velocity distribution. The bismuth profiles show a characteristic deviation from this shape. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:599 / 604
页数:6
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