Sulfide-passivated GaAs(001) .1. Chemistry analysis by photoemission and reflectance anisotropy spectroscopies

被引:59
作者
Paget, D
Bonnet, JE
Berkovits, VL
Chiaradia, P
Avila, J
机构
[1] UNIV PARIS 11,UTILISAT RAYONNEMENT ELECTROMAGNET LAB,F-91405 ORSAY,FRANCE
[2] AF IOFFE PHYS TECH INST,ST PETERSBURG 194021,RUSSIA
[3] UNIV ROMA TOR VERGATA,DIPARTIMENTO FIS,I-00133 ROME,ITALY
[4] INST NAZL STRUTTURA MAT,I-00133 ROME,ITALY
来源
PHYSICAL REVIEW B | 1996年 / 53卷 / 08期
关键词
D O I
10.1103/PhysRevB.53.4604
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated the surface chemistry of (NH4)(2)S-passivated GaAs(001) by studying this surface after passivation and after several subsequent annealings. We have used ultraviolet photoemission spectroscopy (UPS) at a near-normal takeoff angle and at a takeoff angle of 70 degrees. We have also used, in the same ultrahigh-vacuum chamber, reflectance anisotropy spectroscopy, which probes the optical transitions due to surface dimers, and therefore provides useful information for the interpretation of core-level spectra. We find that gallium dimers appear after annealing to 520 degrees C due to sulfur desorption. At the same stage, there appears in the corresponding 3d core-level spectrum a surface component lying at a relative binding energy of -0.32 eV with respect to the volume contribution. Arsenic dimers appear after annealing to 360 degrees C, following the desorption of excess arsenic. In the same way, there appears in the arsenic 3d core-level spectrum a component at a relative binding energy of -0.28 eV. After desorption of the passivating overlayer the gallium-terminated part of the surface is essentially covered with sulfur. These sulfur atoms are dimerized, and contribute to a line in the reflectance anisotropy spectrum. At this same stage, the arsenic-terminated one is covered with excess arsenic. Unlike what was believed previously from UPS analysis, As-S chemical bonds are situated only in the passivating overlayer, which contains no gallium atoms. Comparison of the core-level spectra as a function of takeoff angle shows that the progressive desorption of this overlayer produces a change of its morphology.
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页码:4604 / 4614
页数:11
相关论文
共 40 条
[31]   ELECTRONIC-STRUCTURE AND SCHOTTKY-BARRIER FORMATION ON GAAS(100) SURFACES PREPARED BY THERMAL-DESORPTION OF A PROTECTIVE ARSENIC COATING [J].
SPINDT, CJ ;
YAMADA, M ;
MEISSNER, PL ;
MIYANO, KE ;
KENDELEWICZ, T ;
HERRERAGOMEZ, A ;
SPICER, WE ;
ARKO, AJ .
PHYSICAL REVIEW B, 1992, 45 (19) :11108-11119
[32]  
SPINDT CJ, 1990, ELECTROCHEMICAL SOC, V90, P3
[33]  
SPINDT CJ, 1989, APPL PHYS LETT, V55, P863
[34]   SURFACE EVOLUTION DURING MOLECULAR-BEAM EPITAXY DEPOSITION OF GAAS [J].
SUDIJONO, J ;
JOHNSON, MD ;
SNYDER, CW ;
ELOWITZ, MB ;
ORR, BG .
PHYSICAL REVIEW LETTERS, 1992, 69 (19) :2811-2814
[35]   SYNCHROTRON RADIATION PHOTOEMISSION ANALYSIS FOR (NH4)2SX-TREATED GAAS [J].
SUGAHARA, H ;
OSHIMA, M ;
OIGAWA, H ;
SHIGEKAWA, H ;
NANNICHI, Y .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (08) :4349-4353
[36]   BONDING STATES OF CHEMISORBED SULFUR-ATOMS ON GAAS [J].
SUGAHARA, H ;
OSHIMA, M ;
KLAUSER, R ;
OIGAWA, H ;
NANNICHI, Y .
SURFACE SCIENCE, 1991, 242 (1-3) :335-340
[37]   CHEMISTRY OF S/GAAS AND METAL S/GAAS SYSTEMS [J].
SUGAHARA, H ;
OSHIMA, M ;
OIGAWA, H ;
NANNICHI, Y .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1993, 11 (01) :52-59
[38]   REMOVAL OF THE SULFUR PASSIVATION OVERLAYER ON A (NH4)2SX-TREATED GAAS SURFACE BY VACUUM-ULTRAVIOLET IRRADIATION [J].
TAKAKUWA, Y ;
NIWANO, M ;
FUJITA, S ;
TAKEDA, Y ;
MIYAMOTO, N .
APPLIED PHYSICS LETTERS, 1991, 58 (15) :1635-1637
[39]   TEMPERATURE-DEPENDENT CHEMICAL AND ELECTRONIC-STRUCTURE OF RECONSTRUCTED GAAS (100) SURFACES [J].
VITOMIROV, IM ;
RAISANEN, AD ;
FINNEFROCK, AC ;
VITURRO, RE ;
BRILLSON, LJ ;
KIRCHNER, PD ;
PETTIT, GD ;
WOODALL, JM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (04) :1898-1903
[40]   CHEMICAL AND ELECTROCHEMICAL TREATMENTS OF GAAS WITH NA2S AND (NH4)2S SOLUTIONS - A SURFACE CHEMICAL STUDY [J].
YOTA, J ;
BURROWS, VA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04) :1083-1088