Halogenation and butylation of diamond surfaces by reactions in organic solvents

被引:43
作者
Ikeda, Y
Saito, T
Kusakabe, K
Morooka, S [1 ]
Maeda, H
Taniguchi, Y
Fujiwara, Y
机构
[1] Kyushu Univ, Grad Sch Engn, Dept Mat Phys & Chem, Fukuoka 81281, Japan
[2] Kyushu Univ, Grad Sch Engn, Dept Chem & Biochem, Fukuoka 81281, Japan
关键词
diamond surface; butylation; chlorination; surface modification; organic reaction;
D O I
10.1016/S0925-9635(97)00304-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Hydrogenated diamond powder was chlorinated by treatment with sulfuryl chloride in chloroform at 50 degrees C. The disappearance of C-H stretching peaks showed that most of the hydrogen was substituted by chlorine in this procedure. The chlorinated diamond was then reacted with butyllithium dissolved in tetrahydrofuran at 30 degrees C. Butyl groups incorporated onto the diamond surface were decomposed by flash pyrolysis at temperatures between 255 and 1040 degrees C, and all organic fragments were recovered. The fraction of butylated surface carbons to total surface carbons was calculated to be 0.055. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:830 / 834
页数:5
相关论文
共 27 条
[21]   DIAMOND CERAMIC COATING OF THE FUTURE [J].
SPEAR, KE .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1989, 72 (02) :171-191
[22]   MODIFICATION OF POLYETHYLENETEREPHTHALATE BY IMPLANTATION OF NITROGEN-IONS [J].
SVORCIK, V ;
ENDRST, R ;
RYBKA, V ;
HNATOWICZ, V ;
CERNY, F .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (02) :582-584
[23]   Control of selective tungsten chemical vapor deposition by monolayer nitridation of silicon surface [J].
Takami, S ;
Saito, T ;
Fujii, M ;
Egashira, Y ;
Komiyama, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (02) :L38-L40
[24]   Gas-phase concentration measurements and diamond film composition from chlorine assisted CVD [J].
Tsang, RS ;
Rego, CA ;
May, PW ;
Thumim, J ;
Ashfold, MNR ;
Rosser, KN ;
Younes, CM ;
Holt, MJ .
DIAMOND AND RELATED MATERIALS, 1996, 5 (3-5) :359-365
[25]   EPITAXIAL-GROWTH MECHANISM OF DIAMOND CRYSTAL IN CH4-H2 PLASMA [J].
TSUDA, M ;
NAKAJIMA, M ;
OIKAWA, S .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1986, 108 (19) :5780-5783
[26]   SURFACE MODIFICATION OF POWDERS WITH CARBOXYLIC-ACIDS [J].
WOLFRUM, SM ;
PONJEE, JJ .
JOURNAL OF MATERIALS SCIENCE LETTERS, 1989, 8 (06) :667-669
[27]   CURRENT ISSUES AND PROBLEMS IN THE CHEMICAL VAPOR-DEPOSITION OF DIAMOND [J].
YARBROUGH, WA ;
MESSIER, R .
SCIENCE, 1990, 247 (4943) :688-696