The roles of argon addition in the hot filament chemical vapor deposition system

被引：66

作者：

Zhang, YF ^{[1
]}

Zhang, F

Gao, QJ

Peng, XF

Lin, ZD

机构：

[1] Peking Univ, Dept Phys, Beijing 100871, Peoples R China

[2] Beijing Inst Powder Met, Beijing 100078, Peoples R China

来源：

关键词：

diamond films; heated filament CVD; nano-crystalline; electron microscopy;

D O I：

10.1016/S0925-9635(01)00383-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nano-crystalline diamond films were successfully deposited using CH4/H-2/Ar gas mixture by hot filament chemical vapor deposition (HFCVD) method. The characterizations of the as-grown films are carried out by using field emission scanning electron microscopy (FE-SEM) and high-resolution transmission electron microscopy (HR-TEM). The results show that the film consists of nano-crystalline diamond grains with sizes ranging from 4 to 30 nm. High renucleation rates are found and attributed to the formation of these nano-diamond grains. The roles that Ar plays in HFCVD system are discussed. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：1523 / 1527

页数：5

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