Surface smoothness and step bunching on GaAs (111)B facets formed by molecular beam epitaxy

被引:7
作者
Nakamura, Y
Tanaka, I
Takeuchi, N
Koshiba, S
Noge, H
Sakaki, H
机构
[1] JRDC,QUANTUM TRANSIT PROJECT,MEGURO KU,TOKYO 153,JAPAN
[2] NIKON INC,SAKAE KU,YOKOHAMA,KANAGAWA 244,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 07期
关键词
GaAs trapezoidal structure; atomic force microscopy; (111)B facet; multi-atomic step; step bunching;
D O I
10.1143/JJAP.35.4038
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaAs trapezoidal structures grown by molecular beam epitaxy on mesa-patterned (001) substrates have been studied by atomic force microscopy to clarify the morphology of (111)B facet planes. It is found that multi-atomic steps of 1-4 nm in height Delta appear on the facets with typical periods Lambda of 30-60 nm. When the mis-orientation angle Delta theta of mesa-stripes with respect to [110] increases from 2 degrees to 7 degrees, the corrugation height Delta is found to increase monotonically. Thus the mis-orientation angle Delta theta must be minimized to form smooth facet structures.
引用
收藏
页码:4038 / 4039
页数:2
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