Correlation between the sign of strain and the surface morphology and defect structure of InAlAs grown on vicinal (111)BInP

被引:1
作者
Georgakilas, A
Tsagaraki, K
Harteros, K
Hatzopoulos, Z
Vilà, A
Bécourt, N
Peiro, F
Cornet, A
Chrysanthakopoulos, N
Calamiotou, M
机构
[1] FORTH, IESL, Microelect Res Grp, Heraklion 71110, Crete, Greece
[2] Univ Crete, Dept Phys, Heraklion 71110, Crete, Greece
[3] Univ Barcelona, Fac Fis, Dept Elect, EME, E-08028 Barcelona, Spain
[4] Univ Athens, Dept Phys, Solid State Sect, Zografos 15784, Greece
关键词
molecular beam epitaxy; InAlAs; atomic force microscopy; X-ray;
D O I
10.1016/S0040-6090(98)01280-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The MBE growth of InAlAs layers on vicinal (111)BInP substrates, misoriented by 1 degrees toward [(2) over bar 11], has been investigated. Scanning electron microscopy and atomic force microscopy revealed a dependence of InAlAs surface morphology on the layer's strain type: a strong trend to excessive surface step bunching characterized the compressively strained layers while much more regular surfaces, often with depressions, were observed on tensilly strained layers. However, high resolution ii-ray diffraction suggested generally, a better crystalline structure for compressive layers and this was verified by transmission electron microscopy since twins and other defects appear to nucleate easily on tensile layers. Our results indicate the significant influence of the sign of strain in the strain relaxation-defect nucleation and adatom surface diffusion processes. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:218 / 221
页数:4
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