Two-dimensional spatial profiles of plasma parameters in DC reactive magnetron sputtering of indium-tin-oxide

被引：10

作者：

Muta, M ^{[1
]}

Ohgushi, S ^{[1
]}

Matsuda, Y ^{[1
]}

Fujiyama, H ^{[1
]}

机构：

[1] Nagasaki Univ, Dept Elect Engn & Comp Sci, Nagasaki 852, Japan

来源：

THIN SOLID FILMS | 1999年 / 341卷 / 1-2期

关键词：

ITO; reactive magnetron sputtering; two-dimensional laser induced fluorescence (2D-LIF); two-dimensional optical emission spectroscopy (2D-OES);

D O I：

10.1016/S0040-6090(98)01528-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Two-dimensional spatial profiles of plasma parameters during the DC magnetron sputtering process of an indium-tin-oxide (ITO) target in Ar/O-2 are studied. Two-dimensional spatial profiles of sputtered indium atoms in the ground state and of argon and indium atoms in their excited states are measured by two-dimensional laser induced fluorescence (2D-LIF) and two-dimensional optical emission spectroscopy (2D-OES), respectively. The 2D-OES profiles of the excited species have strong radial inhomogeneity due to magnetron plasma ring formation. On the other hand, the 2D-LIF profile of sputtered In atoms has the maximum at the discharge center axis except for the proximity of the cathode and has a smooth decrease from the cathode to the anode. Effects of the preset partial-pressure of introduced O-2 on these parameters is also reported. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：221 / 224

页数：4

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