Photolabile protecting groups in metal-organic frameworks: preventing interpenetration and masking functional groups

被引：71

作者：

Deshpande, Rajesh K. ^{[1
]}

Waterhouse, Geoffrey I. N. ^{[2
]}

Jameson, Geoffrey B. ^{[1
]}

Telfer, Shane G. ^{[1
]}

机构：

[1] MacDiarmid Inst Adv Mat & Nanotechnol, Inst Fundamental Sci, Palmerston North, New Zealand

[2] Univ Auckland, Sch Chem Sci, Auckland 1, New Zealand

来源：

CHEMICAL COMMUNICATIONS | 2012年 / 48卷 / 10期

关键词：

SURFACE-AREAS; CRYSTAL; COMPLEXES; CHEMISTRY; ACID; MOFS;

D O I：

10.1039/c1cc12884a

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Photolabile groups can be incorporated into metal-organic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc(II). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.

引用

页码：1574 / 1576

页数：3

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