AlGaN/GaN modulation-doped field-effect transistors with an Mg-doped carrier confinement layer

被引:19
作者
Chang, SJ [1 ]
Wei, SC
Su, YK
Liu, CH
Chen, SC
Liaw, UH
Tsai, TY
Hsu, TH
机构
[1] Natl Cheng Kung Univ, Inst Microelect, Tainan 70101, Taiwan
[2] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
[3] Nan Jeon Jr Coll Tech & Commerce, Dept Elect Engn, Yenshui 737, Taiwan
[4] Natl Yunlin Univ Sci & Technol, Inst Elect & Informat Engn, Touliu, Yunlin, Taiwan
[5] Chin Min Coll, Dept Elect Engn, To Fen 351, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2003年 / 42卷 / 6A期
关键词
AlGaN/GaN; MODFET; Mg doping; leakage current;
D O I
10.1143/JJAP.42.3316
中图分类号
O59 [应用物理学];
学科分类号
摘要
AlGaN/GaN modulation-doped field-effect transistors (MODFETs) with and without the Mg-doped semi-insulating carrier confinement layer were prepared and a detailed study on the electrical properties of these samples was performed. The addition of the Mg-doped semi-insulating carrier confinement layer resulted in the degradation of crystal quality. Thus, higher values of g(m), I-DS and the gate voltage swing are achieved by conventional MODFETs. The source-to-drain (S-D) leakage current of conventional MODFETs was also higher, since carriers could flow through the thick unintentionally doped GaN layer. However, the S-D leakage current was reduced from 50 mA/mm to 6 mA/mm with the insertion of the Mg-doped semi-insulating carrier confinement layer.
引用
收藏
页码:3316 / 3319
页数:4
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