High-rate laser-direct-write dry etching of titanium

被引：3

作者：

Lehmann, O

Stuke, M

机构：

[1] Max-Planck-Instilut F. Biophysik. C., D-37018 Göttingen

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1996年 / 63卷 / 02期

关键词：

D O I：

10.1007/BF01567641

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium surfaces can be etched spatially selective in a chlorine atmosphere under 488 nm cw Ar+-laser irradiation focused to 3 mu m with well-controlled etch depth and high etch rate. By scanning the substrate, patterns can be generated by laser direct writing with high scan speed. The dependence of the etch rate on various parameters, such as laser power, scan speed and chlorine pressure, is described, and the impact on three-dimensional structuring of titanium is discussed.

引用

页码：139 / 141

页数：3

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