Thermal behavior of hydrogen molecules trapped by multivacancies in silicon

被引:22
作者
Mori, T
Otsuka, K
Umehara, N
Ishioka, K
Kitajima, M
Hishita, S
Murakami, K
机构
[1] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki, Japan
[2] Natl Res Inst Met, Tsukuba, Ibaraki 305, Japan
[3] Natl Inst Res Inorgan Mat, Tsukuba, Ibaraki 305, Japan
来源
PHYSICA B | 2001年 / 302卷
关键词
hydrogen molecule; multivacancy; annealing behavior; activation energy;
D O I
10.1016/S0921-4526(01)00435-5
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We have investigated the thermal behavior of hydrogen molecules trapped by multivacancies in crystalline silicon by performing thermal annealing. The hydrogen molecules had two Raman components with different annealing stages. Their activation energies for annihilation were 0.7 +/- 0.3 and 0.5 +/- 0.2eV for the main component and the shoulder, respectively. The former was attributed to the potential barrier for a hydrogen molecule to escape from a multivacancy trap, and the latter to move from a metastable site around the multivacancy trap to the most stable site. Annealing at 610 degreesC suggested that relatively large multivacancies such as V-6 and V-10 are possible trapping centers of the hydrogen molecules. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:239 / 243
页数:5
相关论文
共 14 条
[1]   Multivacancy and its hydrogen decoration in crystalline Si [J].
Akiyama, T ;
Okamoto, Y ;
Saito, M ;
Oshiyama, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1999, 38 (12A) :L1363-L1365
[2]   ELECTRON-PARAMAGNETIC RESONANCE OF LATTICE DAMAGE IN OXYGEN-IMPLANTED SILICON [J].
BROWER, KL ;
BEEZHOLD, W .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (08) :3499-&
[3]   Vacancy-hydrogen complexes in group-IV semiconductors [J].
Budde, M ;
Nielsen, BB ;
Keay, JC ;
Feldman, LC .
PHYSICA B-CONDENSED MATTER, 1999, 273-4 :208-211
[4]   Spectroscopic studies of H-decorated interstitials and vacancies in thin-film silicon exfoliation [J].
Chabal, YJ ;
Weldon, MK ;
Caudano, Y ;
Stefanov, BB ;
Raghavachari, K .
PHYSICA B-CONDENSED MATTER, 1999, 273-4 :152-163
[5]   Hydrogen passivation of donors and hydrogen states in heavily doped n-type silicon [J].
Fukata, N ;
Sasaki, S ;
Fujimura, S ;
Haneda, H ;
Murakami, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (07) :3937-3941
[6]   Hydrogen molecules trapped by multivacancies in silicon [J].
Ishioka, K ;
Kitajima, M ;
Tateishi, S ;
Nakanoya, K ;
Fukata, N ;
Mori, T ;
Murakami, K ;
Hishita, S .
PHYSICAL REVIEW B, 1999, 60 (15) :10852-10854
[7]   Three different forms of hydrogen molecules in silicon [J].
Kitajima, M ;
Ishioka, K ;
Nakanoya, K ;
Tateishi, S ;
Mori, T ;
Fukata, N ;
Murakami, K ;
Hishita, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1999, 38 (7A) :L691-L693
[8]   Raman spectroscopy of hydrogen molecules in crystalline silicon [J].
Leitch, AWR ;
Alex, V ;
Weber, J .
PHYSICAL REVIEW LETTERS, 1998, 81 (02) :421-424
[9]   H2 molecules in c-Si after hydrogen plasma treatment [J].
Leitch, AWR ;
Alex, V ;
Weber, J .
SOLID STATE COMMUNICATIONS, 1998, 105 (04) :215-219
[10]   Hydrogen-oxygen interaction in silicon at around 50°C [J].
Markevich, VP ;
Suezawa, M .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (06) :2988-2993