Gallium nitride diffractive microlenses using in ultraviolet micro-optics system

被引：3

作者：

Hou, CH ^{[1
]}

Li, MH

Chen, CC

Chang, JY

Sheu, JK

Chi, GC

Wu, C

Cheng, WT

Yeh, JH

机构：

[1] Natl Cent Univ, Inst Opt Sci, Jungli 320, Taiwan

[2] Natl Cent Univ, Dept Phys, Jungli 320, Taiwan

[3] Canyon Mat Inc, San Diego, CA 92121 USA

[4] Nanoarchitect Res Corp, Hsinchu, Taiwan

来源：

OPTICAL REVIEW | 2003年 / 10卷 / 04期

关键词：

diffractive microlens; gray-level mask; GaN; AlN; solar-blind; band-pass filter;

D O I：

10.1007/s10043-003-0287-1

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this work, diffractive microlenses were fabricated in GaN using a gray-level mask and inductively coupled plasma etching technique. We also propose to insert the GaN/AlN band- pass filter in the microlenses to enhance the ultraviolet/visible rejection ratio. Due to high transparency of GaN and AlN in UV, the microlenses can potentially be used in a UV micro-optics system such as for solar-blind detection. In the design example of this work, the structure may enhance the ultaviolet/visible rejection to 10(2).

引用

页码：287 / 289

页数：3

共 20 条

[11] Semiconductor microlenses fabricated by one-step wet etching [J].