GaN Schottky barrier photodetectors with SiN/GaN nucleation layer

被引:23
作者
Jhou, Y. D. [1 ]
Chang, S. J.
Su, Y. K.
Lee, Y. Y.
Liu, C. H.
Lee, H. C.
机构
[1] Natl Cheng Kung Univ, Inst Microelect, Tainan 701, Taiwan
[2] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 701, Taiwan
[3] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 701, Taiwan
[4] Natl Cheng Kung Univ, Ctr Micro Nano Sci & Technol, Tainan 701, Taiwan
[5] Natl Cheng Kung Univ, Inst Nanotechnol & Microsyst Engn, Tainan 701, Taiwan
[6] Natl Cheng Kung Univ, Inst Electroopt Sci & Engn, Tainan 701, Taiwan
关键词
DOUBLE-BUFFER LAYERS; NITRIDE-BASED LEDS; P-I-N; ULTRAVIOLET DETECTORS; UV PHOTODETECTORS; CAP LAYERS; DIODES; PHOTODIODES; DETECTIVITY; SUBSTRATE;
D O I
10.1063/1.2779854
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaN Schottky barrier photodetectors with SiN/GaN nucleation layer were fabricated. It was found that leakage current was much smaller and much less bias dependent for the photodetector with SiN/GaN nucleation layer, as compared to the photodetector with conventional low-temperature GaN nucleation layer. It was also found that effective Schottky barrier height increased from 1.27 to 1.53 eV with the insertion of the SiN layer. Furthermore, it was found that the authors can effectively suppress internal gain of the detector and enhance ultraviolet to visible rejection ratio by using the SiN/GaN nucleation layer. (C) 2007 American Institute of Physics.
引用
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页数:3
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