Intense blue photoluminescence from Si-in-SiNx thin film with high-density nanoparticles

被引:22
作者
Liu, C [1 ]
Li, CR [1 ]
Ji, AL [1 ]
Ma, LB [1 ]
Wang, YQ [1 ]
Cao, ZX [1 ]
机构
[1] Inst Phys, Natl Lab Condensed Matter Phys, Beijing 100080, Peoples R China
关键词
D O I
10.1088/0957-4484/16/6/053
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Intense photoluminescence in blue was measured in as-deposited Si-in-SiN, films prepared by plasma-enhanced chemical vapour deposition on cold substrates. The density of the silicon nanoparticles amounts to 1.4 x 10(13) cm(-2) as calculated from transmission electron microscope images, and the particle size can be well controlled under 2.6 nm. Rapid annealine, at 500 degrees C for two minutes roughly doubles the photoluminescence intensity, while the peak profile suffers only negligible change. In contrast, annealing at 1050 degrees C results in a broadened spectrum red shifted by about 80 nm. External quantum efficiency for the photoluminescence was estimated to be well above 1.0% by comparing with GaN. This demonstrates that, with appropriate processing parameters, the low-temperature procedure is promising for obtaining applicable light emission from Si-in-SiN, films.
引用
收藏
页码:940 / 943
页数:4
相关论文
共 18 条
  • [1] Porous silicon: a quantum sponge structure for silicon based optoelectronics
    Bisi, O
    Ossicini, S
    Pavesi, L
    [J]. SURFACE SCIENCE REPORTS, 2000, 38 (1-3) : 1 - 126
  • [2] SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS
    CANHAM, LT
    [J]. APPLIED PHYSICS LETTERS, 1990, 57 (10) : 1046 - 1048
  • [3] Quantum confinement contribution to porous silicon photoluminescence spectra
    Cooke, DW
    Muenchausen, RE
    Bennett, BL
    Jacobsohn, LG
    Nastasi, M
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 96 (01) : 197 - 203
  • [4] Role of the interface region on the optoelectronic properties of silicon nanocrystals embedded in SiO2 -: art. no. 085327
    Daldosso, N
    Luppi, M
    Ossicini, S
    Degoli, E
    Magri, R
    Dalba, G
    Fornasini, P
    Grisenti, R
    Rocca, F
    Pavesi, L
    Boninelli, S
    Priolo, F
    Spinella, C
    Iacona, F
    [J]. PHYSICAL REVIEW B, 2003, 68 (08)
  • [5] FISHCER T, 1995, MATER RES SOC S P, V358, P851
  • [6] ELECTRONIC-STRUCTURE OF HYDROGENATED AND UNHYDROGENATED AMORPHOUS SINX (0-LESS-THAN-X-LESS-THAN-1.6) - A PHOTOEMISSION-STUDY
    KARCHER, R
    LEY, L
    JOHNSON, RL
    [J]. PHYSICAL REVIEW B, 1984, 30 (04): : 1896 - 1910
  • [7] The origin of photoluminescence from thin films of silicon-rich silica
    Kenyon, AJ
    Trwoga, PF
    Pitt, CW
    Rehm, G
    [J]. JOURNAL OF APPLIED PHYSICS, 1996, 79 (12) : 9291 - 9300
  • [8] Correlation between structure and photoluminescence in amorphous hydrogenated silicon nitride alloys
    Molinari, M
    Rinnert, H
    Vergnat, M
    [J]. PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2003, 16 (3-4) : 445 - 449
  • [9] Evolution with annealing treatments of the size of silicon nanocrystallites embedded in a SiNx matrix and correlation with optical properties
    Molinari, M
    Rinnert, H
    Vergnat, M
    Weisbecker, P
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2003, 101 (1-3): : 186 - 189
  • [10] Visible photoluminescence in amorphous SiNx thin films prepared by reactive evaporation
    Molinari, M
    Rinnert, H
    Vergnat, M
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (22) : 3499 - 3501