Direct Observation of Nanoscale Size Effects in Ge Semiconductor Nanowire Growth

被引:126
作者
Dayeh, Shadi A. [1 ]
Picraux, S. T. [1 ]
机构
[1] Los Alamos Natl Lab, Ctr Integrated Nanotechnol CINT, Los Alamos, NM 87545 USA
关键词
Nanowire; silicon; germanium; size-dependent growth; vapor-liquid-solid growth; Gibbs-Thomson; LIQUID-SOLID MECHANISM; SILICON NANOWIRES; KINETICS;
D O I
10.1021/nl1019722
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Progress in the synthesis of semiconductor nanowires (NWs) has prompted intensive inquiry into understanding the science of their growth mechanisms and ultimately the technological applications they promise We present new results for the size-dependent growth kinetics of Ge NWs and correlate the results with a direct experimental measurement of the Gibbs Thomson effect, a measured increase in the Ge solute concentration in liquid Au Ge droplets with decreasing diameter This nanoscalc-dependent effect emerges in vapor liquid solid Ge NW growth and leads to a decrease in the NW growth rate for smaller diameter NWs under a wide range of growth conditions with a cutoff in growth at sufficiently small sizes These effects are described quantitatively by an analytical model based on the Gibbs Thomson effect A comprehensive treatment is provided and shown to be consistent with experiment for the effect of NW growth time, temperature, pressure, and doping on the supersaturation of Ge in Au, which determines the growth rate and critical cutoff diameter for NW growth These results support the universal applicability of the Gibbs Thomson effect to sub-100 nm diameter semiconductor NW growth
引用
收藏
页码:4032 / 4039
页数:8
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