Silicon nanowires: Diameter dependence of growth rate and delay in growth

被引:58
作者
Dhalluin, F. [1 ]
Baron, T. [1 ]
Ferret, P. [2 ]
Salem, B. [1 ]
Gentile, P. [3 ]
Harmand, J. -C. [4 ]
机构
[1] CNRS, CEA Grenoble, Lab Technol Microelect, UMR 5129, F-38054 Grenoble, France
[2] MINATEC, LETI, CEA, F-38054 Grenoble, France
[3] MINATEC, SiNaPS, INAC, CEA, F-38054 Grenoble, France
[4] CNRS, Lab Photon & Nanostruct, F-91460 Marcoussis, France
关键词
catalysts; chemical vapour deposition; elemental semiconductors; nanowires; semiconductor growth; semiconductor quantum wires; silicon; LIQUID-SOLID GROWTH; CHEMICAL-VAPOR-DEPOSITION; WHISKERS; KINETICS; TENSION; SHAPE;
D O I
10.1063/1.3373546
中图分类号
O59 [应用物理学];
学科分类号
摘要
We grew Si nanowires by chemical vapor deposition, via the vapor liquid solid growth, using silane as gaseous precursor and gold as catalyst. The results show that the nanowire length depends on their diameter. For nanowires with diameter under 100 nm, the length increases when diameter increases, because of an increase in the growth velocity. For the thicker diameter (d>100 nm), length decreases when diameter increases, due to an apparent incubation time which is all the higher as the diameter is high. We propose a semiempirical model combining Gibbs-Thomson effect and incubation time, which shows good agreement with the experimental data.
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页数:3
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