Structural characterization of TiCx films prepared by plasma based ion implantation

被引:76
作者
Li, G [1 ]
Xia, LF [1 ]
机构
[1] Harbin Inst Technol, Sch Mat Sci & Engn, Harbin 150001, Peoples R China
关键词
TiCx films; PBII; XPS; deconvolution;
D O I
10.1016/S0040-6090(01)01227-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
TiCx films with a wide range of C/Ti ratios have been prepared by plasma based ion implantation. The bonding states and structure were investigated as functions of the relative carbon content to titanium. The results of Rutherford backscattering spectroscopy showed that there was more than 20 at.% hydrogen contained in the films. By the deconvolution of X-ray photoelectron core level spectra, the excess carbon was suggested to lead to the formation of interstitial carbon, amorphous hydrogenated carbon (or graphite), polymer-like carbon, and organic compound of titanium. The cross-sectional transmission electron microscopy (XTEM) displayed that the TiC0.81 films mainly consisted of rod-shaped TiC crystal arranged along the growth direction, while the TiC1.55 films contained a relatively random microstructure. XTEM also provided evidence for the existence of amorphous carbon in carbon-rich films, not graphite. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:16 / 22
页数:7
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