On the low resistance Au/Ge/Pd ohmic contact to n-GaAs

被引:34
作者
Hao, PH
Wang, LC
Deng, F
Lau, SS
Cheng, JY
机构
[1] UNIV CALIF SAN DIEGO,DEPT ELECT & COMP ENGN,LA JOLLA,CA 92093
[2] AT&T BELL LABS,MURRAY HILL,NJ 07974
关键词
D O I
10.1063/1.361788
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report that a Au/Ge/Pd layered structure can result in low contact resistivities (similar to 10(-6) Omega cm(2)) to n-GaAs processed in three temperature ranges (175-200, 340-350, and 425-450 degrees C). The contacts processed below the Au-Ge eutectic temperature (361 degrees C) show good surface and interface morphology, thermal stability, Au wire bondability, and reproducibility. The ohmic contact formation mechanisms are also presented. (C) 1996 American Institute of Physics.
引用
收藏
页码:4211 / 4215
页数:5
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