Band gap reduction in GaNSb alloys due to the anion mismatch

被引:50
作者
Veal, TD
Piper, LFJ
Jollands, S
Bennett, BR
Jefferson, PH
Thomas, PA
McConville, CF [1 ]
Murdin, BN
Buckle, L
Smith, GW
Ashley, T
机构
[1] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England
[2] Univ Surrey, Sch Elect & Phys Sci, Guildford GU2 5XH, Surrey, England
[3] QinetiQ Ltd, Malvern WR14 3PS, Worcs, England
[4] USN, Res Lab, Washington, DC 20375 USA
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1063/1.2058224
中图分类号
O59 [应用物理学];
学科分类号
摘要
The structural and optoelectronic properties in GaNxSb1-x alloys (0 <= x < 0.02) grown by molecular-beam epitaxy on both GaSb substrates and AlSb buffer layers on GaAs substrates are investigated. High-resolution x-ray diffraction (XRD) and reciprocal space mapping indicate that the GaNxSb1-x epilayers are of high crystalline quality and the alloy composition is found to be independent of substrate, for identical growth conditions. The band gap of the GaNSb alloys is found to decrease with increasing nitrogen content from absorption spectroscopy. Strain-induced band-gap shifts, Moss-Burstein effects, and band renormalization were ruled out by XRD and Hall measurements. The band-gap reduction is solely due to the substitution of dilute amounts of highly electronegative nitrogen for antimony, and is greater than observed in GaNAs with the same N content. (C) 2005 American Institute of Physics.
引用
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页码:1 / 3
页数:3
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