An improved definition for modeling the threshold voltage of MOSFETs

被引:23
作者
Ortiz-Conde, A
Rodriguez, J
Sanchez, FJG
Liou, JJ
机构
[1] Univ Simon Bolivar, Dept Elect, Caracas 1080A, Venezuela
[2] Univ Cent Florida, Dept ECE, Orlando, FL 32816 USA
关键词
D O I
10.1016/S0038-1101(98)00138-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Traditionally, the threshold voltage V-T of MOSFETs is modeled using the definition that the strong inversion occurs when the surface band bending is equal to twice the potential in bulk semiconductor. In this paper, an improved V-T definition is proposed. It is demonstrated that V-T calculated from the improved definition is in better agreement with those obtained from several existing V-T extraction methods than the conventional definition. (C) 1998 Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1743 / 1746
页数:4
相关论文
共 13 条
[1]   MEASUREMENT OF THRESHOLD VOLTAGE AND CHANNEL LENGTH OF SUB-MICRON MOSFETS [J].
JAIN, S .
IEE PROCEEDINGS-I COMMUNICATIONS SPEECH AND VISION, 1988, 135 (06) :162-164
[2]  
LATIF Z, 1997, P MICROELECTRONICS C, P281
[3]   Extraction of the threshold voltage of MOSFETs: an overview [J].
Liou, JJ ;
Ortiz-Conde, A ;
Sanchez, FG .
1997 IEEE HONG KONG ELECTRON DEVICES MEETING, PROCEEDINGS, 1997, :31-38
[4]  
LIOU JJ, 1998, IN PRESS MODELING SI
[5]  
LIOU JJ, 1994, ADV SEMICONDUCTOR DE
[6]   A new approach to extract the threshold voltage of MOSFET's [J].
OrtizConde, A ;
Fernandes, EDG ;
Liou, JJ ;
Hassan, MR ;
GarciaSanchez, FJ ;
DeMercato, G ;
Wong, WS .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1997, 44 (09) :1523-1528
[8]  
Schroeder D.K., 1990, SEMICONDUCTOR MAT DE
[9]  
*SIB SYST, 1996, MICROTEC MAN
[10]   CMOS scaling into the nanometer regime [J].
Taur, Y ;
Buchanan, DA ;
Chen, W ;
Frank, DJ ;
Ismail, KE ;
Lo, SH ;
SaiHalasz, GA ;
Viswanathan, RG ;
Wann, HJC ;
Wind, SJ ;
Wong, HS .
PROCEEDINGS OF THE IEEE, 1997, 85 (04) :486-504