Nitride photocatalyst to generate hydrogen gas from water

被引：24

作者：

Iwaki, Yasuhiro ^{[1
]}

Ono, Masato ^{[1
]}

Yamaguchi, Kazuki ^{[1
]}

Kusakabe, Kazuhide ^{[1
]}

Fujii, Katsushi ^{[2
,3
]}

Ohkawa, Kazuhiro ^{[1
,2
]}

机构：

[1] Tokyo Univ Sci, Dept Appl Phys, Shinjyuku Ku, 1-3 Kagurazaka, Tokyo 1628601, Japan

[2] Tokyo Univ Sci, Dept Appl Phys, Japan Sci & Technol Agcy, Expt Res Adv Technol, Tokyo 162, Japan

[3] Tohoku Univ, Ctr Interdisciplinary Res, Sendai, Miyagi 980, Japan

来源：

PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 6 | 2008年 / 5卷 / 06期

关键词：

D O I：

10.1002/pssc.200778536

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We propose a new nitride photocatalyst of an n-n(+)-GaN structure to increase H-2 gas generation. This structure consists of a thin lightly-doped n-type layer on a heavily-doped n(+)-type layer to realize an optimized depletion layer for opticat absorption and highly conductive region, respectively. An optimized n-n(+)-GaN structure could generate much more H-2 gas rather than a single n-GaN layer structure by about 1.4 times.

引用

页码：2349 / +

页数：2

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