Photoelectrochemical reaction and H2 generation at zero bias optimized by carrier concentration of n-type GaN

被引:80
作者
Ono, Masato
Fujii, Katsushi
Ito, Takashi
Iwaki, Yasuhiro
Hirako, Akira
Yao, Takafumi
Ohkawa, Kazuhiro
机构
[1] Tokyo Univ Sci, Dept Appl Phys, Shinjyuku Ku, Tokyo 1628601, Japan
[2] Tokyo Univ Sci, Nakamura Inhomogeneous Crystal Project, Japan Sci & Technol Agcy, Shinjyuku Ku, Tokyo 1628601, Japan
[3] Tohoku Univ, Interdisciplinary Res Ctr, Aoba Ku, Sendai, Miyagi 9808578, Japan
[4] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
关键词
D O I
10.1063/1.2432116
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The authors studied the photoelectrochemical properties dependent on carrier concentration of n-type GaN. The photocurrent at zero bias became the maximum value at the carrier concentration of 1.7x10(17) cm(-3). Using the sample optimized carrier concentration, the authors achieved H-2 gas generation at a Pt counterelectrode without extra bias for the first time. The authors also discussed the mechanism of the dependence of photocurrent on the carrier concentration of GaN. (c) 2007 American Institute of Physics.
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页数:7
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