Biomimetic interfaces for high-performance optics in the deep-UV light range

被引：127

作者：

Lohmueller, Theobald ^{[1
,2
]}

Helgert, Michael ^{[3
]}

Sundermann, Michael ^{[4
]}

Brunner, Robert ^{[3
]}

Spatz, Joachim P. ^{[1
,2
]}

机构：

[1] Max Planck Inst Met Res, Dept New Mat & Biosyst, D-70569 Stuttgart, Germany

[2] Heidelberg Univ, Dept Biophys Chem, D-70569 Stuttgart, Germany

[3] Carl Zeiss, Ctr Technol, D-07745 Jena, Germany

[4] Carl Zeiss, Ctr Technol, D-73447 Oberkochen, Germany

来源：

NANO LETTERS | 2008年 / 8卷 / 05期

关键词：

D O I：

10.1021/nl080330y

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We report an innovative approach for the fabrication of highly light transmissive, antireflective optical interfaces. This is possible due to the discovery that metallic nanoparticles may be used as a lithographic mask to etch nonstraightforward structures into fused silica, which results in a quasihexagonal pattern of hollow, pillar-like protuberances. The far reaching optical performance of these structures is demonstrated by reflection and transmission measurements at oblique angles of incidence over a broad spectral-region ranging from deep-ultraviolet to infrared light.

引用

页码：1429 / 1433

页数：5

共 30 条

[1] Nanopatterning with microdomains of block copolymers using reactive-ion etching selectivity [J].

Asakawa, K ;

Hiraoka, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (10) :6112-6118

[2]

BERNHARD CG, 1967, ENDEAVOUR, V26, P79

[3] Reactive ion etching of cylindrical polyferrocenylsilane block copolymer micelles:: Fabrication of ceramic nanolines on semiconducting substrates [J].

Cao, L ;

Massey, JA ;

Winnik, MA ;

Manners, I ;

Riethmüller, S ;

Banhart, F ;

Spatz, JP ;

Möller, M .

ADVANCED FUNCTIONAL MATERIALS, 2003, 13 (04) :271-276

[4] REDUCTION OF LENS REFLECTION BY MOTH EYE PRINCIPLE [J].

CLAPHAM, PB ;

HUTLEY, MC .

NATURE, 1973, 244 (5414) :281-282

[5] Toward perfect antireflection coatings: numerical investigation [J].

Dobrowolski, JA ;

Poitras, D ;

Ma, P ;

Vakil, H ;

Acree, M .

APPLIED OPTICS, 2002, 41 (16) :3075-3083

[6] Block copolymer micelle nanolithography [J].

Glass, R ;

Möller, M ;

Spatz, JP .

NANOTECHNOLOGY, 2003, 14 (10) :1153-1160

[7] Micro-nanostructured interfaces fabricated by the use of inorganic block copolymer micellar monolayers as negative resist for electron-beam lithography [J].

Glass, R ;

Arnold, M ;

Blümmel, J ;

Küller, A ;

Möller, M ;

Spatz, JP .

ADVANCED FUNCTIONAL MATERIALS, 2003, 13 (07) :569-575

[8] Antireflective submicrometer surface-relief gratings for solar applications [J].

Gombert, A ;

Rose, K ;

Heinzel, A ;

Horbelt, W ;

Zanke, C ;

Blasi, B ;

Wittwer, V .

SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1998, 54 (1-4) :333-342

[9] Improved broadband and quasi-omnidirectional anti-reflection properties with biomimetic silicon nanostructures [J].

Huang, Yi-Fan ;

Chattopadhyay, Surojit ;

Jen, Yi-Jun ;

Peng, Cheng-Yu ;

Liu, Tze-An ;

Hsu, Yu-Kuei ;

Pan, Ci-Ling ;

Lo, Hung-Chun ;

Hsu, Chih-Hsun ;

Chang, Yuan-Huei ;

Lee, Chih-Shan ;

Chen, Kuei-Hsien ;

Chen, Li-Chyong .

NATURE NANOTECHNOLOGY, 2007, 2 (12) :770-774

[10] Optical polymer thin films with isotropic and anisotropic nano-corrugated surface topologies [J].

Ibn-Elhaj, M ;

Schadt, M .

NATURE, 2001, 410 (6830) :796-799

← 1 2 3 →