Nondestructive dislocation delineation using topographically enhanced imaging of surface morphologies in 4H-SiC epitaxial layers

被引:11
作者
Picard, Yoosuf N. [1 ]
Liu, Kendrick X. [1 ]
Stahlbush, Robert E. [1 ]
Twigg, Mark E. [1 ]
Zhang, Xuan [2 ]
Skowronski, Marek [2 ]
机构
[1] USN, Res Lab, Div Elect Sci & Technol, Washington, DC 20375 USA
[2] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA
关键词
D O I
10.1063/1.2903873
中图分类号
O59 [应用物理学];
学科分类号
摘要
The morphology of surface features generated by dislocations present at 4H-SiC epitaxial layer surfaces was investigated by forescattered electron detection (FED) inside a conventional scanning electron microscope. Various growth pit morphologies were correlated to dislocation types using molten KOH etching. Specifically, sharp-apex pits and stripe-shaped pits were consistently linked to screw and edge dislocations, respectively. The size and depth of these growth pits were measured by atomic force microscopy (AFM). Tail-like features were observed by FED emanating from sharp-apex pits and verified by Nomarski optical microscopy (NOM). A mechanism is proposed to explain the FED contrast exhibited by these tail-like features. This mechanism relates the nature of step-flow and spiral growth in the wake of a screw dislocation to the surface distortions resulting in such tail-like features. The Burgers vector direction can thus be determined based on a purely morphological analysis of these tail-like features. The results of this study illustrate the various capabilities of FED for surface imaging as compared to AFM and NOM. The potential for utilizing FED to map dislocation-associated growth pits is discussed. (c) 2008 American Institute of Physics.
引用
收藏
页数:7
相关论文
共 29 条
[1]   Structure of the carrot defect in 4H-SiC epitaxial layers [J].
Benamara, M ;
Zhang, X ;
Skowronski, M ;
Ruterana, P ;
Nouet, G ;
Sumakeris, JJ ;
Paisley, MJ ;
O'Loughlin, MJ .
APPLIED PHYSICS LETTERS, 2005, 86 (02) :021905-1
[2]   Effect of surface inhomogeneities on the electrical characteristics of SiC Schottky contacts [J].
Bhatnagar, M ;
Baliga, BJ ;
Kirk, HR ;
Rozgonyi, GA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1996, 43 (01) :150-156
[3]   Direct determination of dislocation sense of closed-core threading screw dislocations using synchrotron white beam x-ray topography in 4H silicon carbide [J].
Chen, Yi ;
Dudley, Michael .
APPLIED PHYSICS LETTERS, 2007, 91 (14)
[4]   Inhomogeneities in Ni/4H-SiC Schottky barriers: Localized fermi-level pinning by defect states [J].
Ewing, D. J. ;
Porter, L. M. ;
Wahab, Q. ;
Ma, X. ;
Sudharshan, T. S. ;
Tumakha, S. ;
Gao, M. ;
Brillson, L. J. .
JOURNAL OF APPLIED PHYSICS, 2007, 101 (11)
[5]   A simple mapping method for elementary screw dislocations in homoepitaxial SiC layers [J].
Ha, S ;
Vetter, WM ;
Dudley, M ;
Skowronski, M .
SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 :443-446
[6]  
HEINA J, 1995, SCANNING, V17, P387
[7]   WSXM:: A software for scanning probe microscopy and a tool for nanotechnology [J].
Horcas, I. ;
Fernandez, R. ;
Gomez-Rodriguez, J. M. ;
Colchero, J. ;
Gomez-Herrero, J. ;
Baro, A. M. .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2007, 78 (01)
[8]   Nanometer-scale test of the Tung model of Schottky-barrier height inhomogeneity [J].
Im, HJ ;
Ding, Y ;
Pelz, JP ;
Choyke, WJ .
PHYSICAL REVIEW B, 2001, 64 (07)
[9]   Influence of 4H-SiC growth conditions on micropipe dissociation [J].
Kamata, I ;
Tsuchida, H ;
Jikimoto, T ;
Izumi, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2002, 41 (10B) :L1137-L1139
[10]   Structural transformation of screw dislocations via thick 4H-SiC epitaxial growth [J].
Kamata, I ;
Tsuchida, H ;
Jikimoto, T ;
Izumi, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (12A) :6496-6500