Tungsten nanocrystal memory devices improved by supercritical fluid treatment

被引:11
作者
Chen, C. H. [1 ]
Chang, T. C.
Liao, I. H.
Xi, P. B.
Tsai, C. T.
Yang, P. Y.
Hsieh, Joe
Chen, Jason
Chen, U. S.
Chen, J. R.
机构
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 804, Taiwan
[3] Natl Sun Yat Sen Univ, Inst Electroopt Engn, Kaohsiung 804, Taiwan
[4] Natl Sun Yat Sen Univ, Ctr Nanosci & Nanotechnol, Kaohsiung 804, Taiwan
[5] ProMOS Technol, Hsinchu 300, Taiwan
[6] Natl Chiao Tung Univ, Dept Photon, Hsinchu 300, Taiwan
[7] Natl Chiao Tung Univ, Display Inst, Hsinchu 300, Taiwan
关键词
D O I
10.1063/1.2803937
中图分类号
O59 [应用物理学];
学科分类号
摘要
A supercritical CO2 (SCCO2) fluid technique is proposed to improve electrical characteristics for W nanocrystal nonvolatile memory devices, since the thickness and quality of tunnel oxide are critical issues for the fabrication of nonvolatile memory devices. After SCCO2 treatments, C-V curves are restored to normal, as well as the leakage current of W nanocrystal memory devices are reduced significantly. It reveals that W nanocrystal memory devices could be formed with shorter oxidation time, moreover, dangling bonds and trapping states initially created within an incomplete oxidized film will be efficiently repaired after SCCO2 treatment. (c) 2007 American Institute of Physics.
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页数:3
相关论文
共 9 条
[1]   A distributed charge storage with GeO2 nanodots [J].
Chang, TC ;
Yan, ST ;
Hsu, CH ;
Tang, MT ;
Lee, JF ;
Tai, YH ;
Liu, PT ;
Sze, SM .
APPLIED PHYSICS LETTERS, 2004, 84 (14) :2581-2583
[2]   Nanocrystal nonvolatile memory devices [J].
De Blauwe, J .
IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2002, 1 (01) :72-77
[3]   Electrical study of Ge-nanocrystal-based metal-oxide-semiconductor structures for p-type nonvolatile memory applications [J].
Kanoun, M ;
Souifi, A ;
Baron, T ;
Mazen, F .
APPLIED PHYSICS LETTERS, 2004, 84 (25) :5079-5081
[4]   Effects of supercritical CO2 fluid on sputter-deposited hafnium oxide [J].
Liu, Po-Tsun ;
Tsai, Chih-Tsung ;
Yang, Po-Yu .
APPLIED PHYSICS LETTERS, 2007, 90 (22)
[5]   Passivation of SiO2/Si interfaces using high-pressure-H2O-vapor heating [J].
Sakamoto, K ;
Sameshima, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (5A) :2492-2496
[6]   Impact of crystal size and tunnel dielectric on semiconductor nanocrystal memory performance [J].
She, M ;
King, TJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (09) :1934-1940
[7]  
Thean A, 2002, IEEE POTENTIALS, V21, P35, DOI 10.1109/MP.2002.1044216
[8]   Supercritical CO2 fluid for chip resistor cleaning [J].
Wang, CW ;
Chang, RT ;
Lin, WK ;
Lin, RD ;
Liang, MT ;
Yang, JF ;
Wang, JB .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (09) :3485-3488
[9]   Ge-rich Si1-xGex nanocrystal formation by the oxidation of an as-deposited thin amorphous Si0.7Ge0.3 layer [J].
Yoon, TS ;
Kim, KB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (02) :631-634