New ratio method for effective channel length and threshold voltage extraction in MOS transistors

被引:25
作者
Cretu, B [1 ]
Bontchacha, T [1 ]
Ghibaudo, G [1 ]
Balestra, F [1 ]
机构
[1] ENSERG, UMR INPG CNRS, Lab Phys Composants Semicond, F-38016 Grenoble, France
关键词
D O I
10.1049/el:20010467
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new 'ratio' method for effective channel length and threshold voltage extraction in MOS transistors is proposed. The method, which relies on the same function as that used in the well known shift and ratio procedure, enables the effective channel length and threshold voltage difference to br extracted from simple linear regression applied to a short versus long channel correlation plot of the function Y(V-g) = I(d)rootg(m) (I-d being the drain current and g, the transconductance). This method has successfully been applied to 0.18-0.1 mum CMOS technologies.
引用
收藏
页码:717 / 719
页数:3
相关论文
共 8 条
[1]   NEW METHOD FOR THE EXTRACTION OF MOSFET PARAMETERS [J].
GHIBAUDO, G .
ELECTRONICS LETTERS, 1988, 24 (09) :543-545
[2]  
HARDILLIER S, 1997, P IEEE 1997 INT C MI, V10, P63
[3]  
HONG TC, 1987, IEEE T ELECTRON DEV, V34, P2129
[4]  
LEE JI, 1990, ELECTRON LETT, V26, P853
[5]   A SIMPLE PARAMETER EXTRACTION METHOD FOR ULTRA-THIN OXIDE MOSFETS [J].
MCLARTY, PK ;
CRISTOLOVEANU, S ;
FAYNOT, O ;
MISRA, V ;
HAUSER, JR ;
WORTMAN, JJ .
SOLID-STATE ELECTRONICS, 1995, 38 (06) :1175-1177
[6]  
MOURRAIN C, 2000, P IEEE INT C MICR TE, P181
[7]   ON THE HIGH-ELECTRIC-FIELD MOBILITY BEHAVIOR IN SI MOSFETS FROM ROOM TO LIQUID-HELIUM TEMPERATURE [J].
RAIS, K ;
BALESTRA, F ;
GHIBAUDO, G .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1994, 145 (01) :217-221
[8]   A NEW SHIFT AND RATIO METHOD FOR MOSFET CHANNEL-LENGTH EXTRACTION [J].
TAUR, Y ;
ZICHERMAN, DS ;
LOMBARDI, DR ;
RESTLE, PJ ;
HSU, CH ;
HANAFI, HI ;
WORDEMAN, MR ;
DAVARI, B ;
SHAHIDI, GG .
IEEE ELECTRON DEVICE LETTERS, 1992, 13 (05) :267-269