Preparation of intrinsic and N-doped p-type ZnO thin films by metalorganic vapor phase epitaxy -: art. no. 213103

被引:102
作者
Du, GT
Ma, Y
Zhang, YT
Yang, TP
机构
[1] Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130012, Peoples R China
[2] Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dept Phys, Dalian 116023, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.2132528
中图分类号
O59 [应用物理学];
学科分类号
摘要
The intrinsic p-type ZnO thin films were prepared by controlling the oxygen partial pressure during growth. The E-2 (high) mode at 432.2 cm(-1) appeared in the Raman spectrum of the film. The photoluminescence spectra taken at 77 K showed the emission band C in the violet region, which originated from zinc vacancy and varied in intensity in accordance with the quantity of the carrier concentration in the films. The N-doped p-type ZnO films were realized by N-2 plasma. The Raman spectrum showed the dominant A(1) (LO) mode at 580 cm(-1), that was the result of the host-lattice defects generated by N dopant rather than the N-related local vibration modes. (c) 2005 American Institute of Physics.
引用
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页码:1 / 3
页数:3
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