Electron mobility in an AlGaN/GaN two-dimensional electron gas I - Carrier concentration dependent mobility

被引:80
作者
Katz, O [1 ]
Horn, A
Bahir, G
Salzman, J
机构
[1] Technion Israel Inst Technol, Dept Elect Engn, IL-32000 Haifa, Israel
[2] Technion Israel Inst Technol, Microelect Res Ctr, IL-32000 Haifa, Israel
关键词
AlGaN; HFET; magnetoresistance; mobility;
D O I
10.1109/TED.2003.816103
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The transport properties of two-dimensional electron gas (2-DEG) at the AlGaN/GaN interface were studied by characterizing the 2-DEG mobility dependence on carrier concentration, n(s), and temperature. High-quality AlGaN/GaN heterostructures were grown, and heterostructure field, effect transistors (HFETs) using a Fat FET geometry were fabricated. Measurements of 2-DEG mobility were performed by magnetoresistance and capacitance-conductance. In order to understand the dominant transport factors, the mobility was modeled using different scattering mechanisms and compared to our-results. It is found that mobility dependence on n(s) shows a bell-shape behavior overt the whole temperature range. For low n(s) the mobility is dominated by Coulomb interaction from interface charge, and at high n(s) the mobility is dominated by interface roughness. Using previously reported experimental values of interface charge and interface roughness in our modeling, we show good agreement with mobility measurement results. Scattering from interface states in AlGaN/GaN heterostructures, seems to. be related to the. high polarization field in the heterointerface. At temperatures higher than 200K polar optical phonon scattering dominates the transport, yet both interface charge and roughness affect the mobility at the low and high n(s), respectively.
引用
收藏
页码:2002 / 2008
页数:7
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