Iron-acceptor pairs in silicon: Structure and formation processes

被引:28
作者
Zhao, S [1 ]
Assali, LVC [1 ]
Justo, JF [1 ]
Gilmer, GH [1 ]
Kimerling, LC [1 ]
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
关键词
D O I
10.1063/1.1389763
中图分类号
O59 [应用物理学];
学科分类号
摘要
We performed a theoretical investigation on the properties of iron-acceptor impurity pairs (Fe-A, with A=B, Al, Ga, and In) in silicon. The calculations were performed within the framework of an ionic model, including elastic and electrostatic interactions. In contrast to the conventional point charge ionic model, our model includes a correction to the electrostatic interaction that takes into account the valence electronic cloud polarization, which adds a short range, attractive interaction to Fe-A pair bonding, and includes the silicon lattice relaxation due to the atomic size difference between the acceptor and the lattice atoms. Our results are in good agreement with the experimental trends among the Fe-A pairs, describing the increase in the pair donor energy level with increasing A principal quantum number and decreasing pair separation distance, and the pair configurational symmetries. (C) 2001 American Institute of Physics.
引用
收藏
页码:2744 / 2754
页数:11
相关论文
共 52 条
[41]   Photo-induced iron atom motion of iron-acceptor pairs in silicon [J].
Sakauchi, S ;
Suezawa, M ;
Sumino, K .
ICDS-18 - PROCEEDINGS OF THE 18TH INTERNATIONAL CONFERENCE ON DEFECTS IN SEMICONDUCTORS, PTS 1-4, 1995, 196- :1345-1349
[42]   Recombination-enhanced Fe atom jump between the first and the second neighbor site of Fe-acceptor pair in Si [J].
Sakauchi, S ;
Suezawa, M ;
Sumino, K ;
Nakashima, H .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (11) :6198-6203
[43]  
TAKAHASHI H, 1992, MATER SCI FORUM, V83, P155, DOI 10.4028/www.scientific.net/MSF.83-87.155
[44]   CHARGE-STATE-DEPENDENT ACTIVATION-ENERGY FOR DIFFUSION OF IRON IN SILICON [J].
TAKAHASHI, H ;
SUEZAWA, M ;
SUMINO, K .
PHYSICAL REVIEW B, 1992, 46 (03) :1882-1885
[45]   The excitation spectrum of the trigonal and the orthorhombic FeIn centres in silicon [J].
Tidlund, P ;
Kleverman, M ;
Grimmeiss, HG .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1996, 11 (05) :748-752
[47]   ELECTRON-PARAMAGNETIC RESONANCE ON IRON-ACCEPTOR PAIRS IN SILICON [J].
VANKOOTEN, JJ ;
WELLER, GA ;
AMMERLAAN, CAJ .
PHYSICAL REVIEW B, 1984, 30 (08) :4564-4570
[48]   TRANSITION-METALS IN SILICON [J].
WEBER, ER .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 30 (01) :1-22
[49]   THE REACTION-KINETICS OF IRON-BORON PAIR FORMATION AND DISSOCIATION IN P-TYPE SILICON [J].
WIJARANAKULA, W .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (01) :275-281
[50]  
WUNSTEL K, 1982, APPL PHYS A-MATER, V27, P207, DOI 10.1007/BF00619081