Quantum wire structures incorporating (GaAs)(m)(GaP)(n) short-period superlattice fabricated by atomic layer epitaxy

被引:7
作者
Isshiki, H
Aoyagi, Y
Sugano, T
机构
[1] Frontier Research Program, Inst. of Phys. and Chemical Research, Wako-shi, Saitama 351-01
基金
日本科学技术振兴机构;
关键词
quantum wire; superlattice; atomic layer epitaxy; selective growth; PL (photoluminescence); TEM (transmission electron microscopy);
D O I
10.1016/S0169-4332(96)00987-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Lateral confined systems of (GaAs)(m)(GaP)(n) short-period superlattice (SPSL) fabricated by using atomic layer epitaxy (ALE), for composition control in quantum nano-structures, are demonstrated. (GaAs)(m)(GaP)(n) SPSL were grown on V-grooved GaAs substrates by the localized-ALE on nanometer scale. The lateral confined systems composed of well-defined (GaAs)(m)(GaP)(n) SPSL have been confirmed via transmission electron microscopy (TEM) and photoluminescence (PL) measurements. Also GaAs/(GaAs)(m)(GaP)(n)-SPSL quantum wire structures were fabricated by ALE growth, and composition control in the structures was successfully realized for the first time.
引用
收藏
页码:122 / 126
页数:5
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