Signature of intrinsic defects in SiC:: Ab initio calculations of hyperfine tensors -: art. no. 193102

被引:59
作者
Bockstedte, M [1 ]
Heid, M [1 ]
Pankratov, O [1 ]
机构
[1] Univ Erlangen Nurnberg, Lehrstuhl Theoret Festkorperphys, D-91058 Erlangen, Germany
关键词
D O I
10.1103/PhysRevB.67.193102
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
To reveal the microscopic origin of the spin-resonance centers in 3C- and 4H-SiC, we perform first-principles calculations of the hyperfine tensors for vacancy-related defects and interstitials. The calculations for the silicon vacancy corroborates the earlier experimental identification. The signature of the carbon vacancy in 4H-SiC, in contrast to the silicon vacancy, is found to discriminate between cubic and hexagonal sites. The EI5 center in 4H-SiC can be attributed to a carbon vacancy at the cubic site. The assignment of the T5 center in 3C-SiC to a carbon vacancy or a complex of a carbon vacancy with hydrogen is not supported. The EI6 center in 4H-SiC originally identified as a silicon antisite is not compatible with the HF signature of this defect.
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