Rapid and direct micro-machining/patterning of polymer materials by oxygen MeV ion beam irradiation through masks

被引：9

作者：

Brun, S. ^{[1
]}

Guibert, G. ^{[1
]}

Meunier, C. ^{[2
]}

Guibert, E. ^{[1
]}

Keppner, H. ^{[1
]}

Mikhailov, S. ^{[1
]}

机构：

[1] Inst Microtechnol Appl, CH-2300 La Chaux De Fonds, Switzerland

[2] Univ Franche Comte, Inst FEMTO ST, CNRS, UMR 6174, F-25211 Montbeliard, France

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2011年 / 269卷 / 20期

关键词：

MeV ions beam machining; Mask; Oxygen; SURFACE MODIFICATION; PTFE; POLYTETRAFLUOROETHYLENE; FILM;

D O I：

10.1016/j.nimb.2011.02.058

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

PTFE (PolyTetraFluoroEthylene), often called Teflon, is a well-known polymer for being a non-stick material with good thermal properties. Moreover, PTFE is biocompatible and especially it is a cyto-compatible polymer. To enable bonding, a chemical etching based on sodium solutions is generally used to modify surfaces. In this paper we study the etching of PTFE using an oxygen ion beam in the MeV energy range. We present micro-patterning of PIPE through masks with two fluences of 5 x 10(15) and 1 x 10(16) ion cm(-2). As is demonstrated the use of a mask allows structuring of large areas while maintaining a distance between the mask and sample makes industrial applications possible. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：2422 / 2426

页数：5

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