Effect of Spin Speed and Solution Concentration on the Directed Assembly of Polymer Blends

被引:25
作者
Fang, Liang [1 ]
Wei, Ming [1 ]
Barry, Carol [1 ]
Mead, Joey [1 ]
机构
[1] Univ Massachusetts Lowell, Dept Plast Engn, NSF Nanoscale Sci & Engn Ctr High Rate Nanomfg, Lowell, MA 01854 USA
基金
美国国家科学基金会;
关键词
BLOCK-COPOLYMER LITHOGRAPHY; SURFACE DEFORMATION MODES; PHASE-SEPARATION; THIN-FILMS; PATTERNED TEMPLATES; DIBLOCK COPOLYMERS; CAST; MORPHOLOGY; FABRICATION; ARRAYS;
D O I
10.1021/ma1017082
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Directed assembly of polymer blends using chemically heterogeneous patterns during spin-coating can be used to produce nanopatterned polymer structures. Well-ordered morphologies are obtained when the characteristic length of a polymer blend is commensurate with pat tern periodicity. In this paper, spin-coating speed and solution concentration were used to control the characteristic length of a polystyrene (PS)/poly(acrylic acid) (PAA) blend. With increasing spin speed or reducing solution concentration, the characteristic length decreased. Critical spin speeds or solution concentrations that produced the required characteristic length commensurate with the given pattern periodicity were predicted. Well-ordered morphologies were obtained when spin speed or solution concentration was close to the critical value. A new method of image analysis was introduced to quantitatively evaluate the quality of replication of the underlying pattern. The range of commensurability between characteristic length and pattern periodicity for well-ordered morphologies was investigated. When the range of commensurability was within 20%, well-ordered morphologies were produced.
引用
收藏
页码:9747 / 9753
页数:7
相关论文
共 51 条
[1]   Phase decomposition in polymer blend films cast on homogeneous substrates modified by self-assembled monolayers [J].
Bergues, B ;
Lekki, J ;
Budkowski, A ;
Cyganik, P ;
Lekka, M ;
Bernasik, A ;
Rysz, J ;
Postawa, Z .
VACUUM, 2001, 63 (1-2) :297-305
[2]   Surface-induced structure formation of polymer blends on patterned substrates [J].
Böltau, M ;
Walheim, S ;
Mlynek, J ;
Krausch, G ;
Steiner, U .
NATURE, 1998, 391 (6670) :877-879
[3]   Fabrication of nanostructures with long-range order using block copolymer lithography [J].
Cheng, JY ;
Ross, CA ;
Thomas, EL ;
Smith, HI ;
Vancso, GJ .
APPLIED PHYSICS LETTERS, 2002, 81 (19) :3657-3659
[4]   Multiscale Directed Assembly of Polymer Blends Using Chemically Functionalized Nanoscale-Patterned Templates [J].
Chiota, Jason ;
Shearer, John ;
Wei, Ming ;
Barry, Carol ;
Mead, Joey .
SMALL, 2009, 5 (24) :2788-2791
[5]   Patterning phase separation in polymer films with dip-pen nanolithography [J].
Coffey, DC ;
Ginger, DS .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2005, 127 (13) :4564-4565
[6]   Exploring the manufacturability of using block copolymers as resist materials in conjunction with advanced lithographic tools [J].
Craig, Gordon S. W. ;
Nealey, Paul F. .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06) :1969-1975
[7]   Self-assembly of block copolymers on lithographically defined nanopatterned substrates [J].
Craig, Gordon S. W. ;
Nealey, Paul F. .
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2007, 20 (04) :511-517
[8]   Solvent and polymer concentration effects on the surface morphology evolution of immiscible polystyrene/poly(methyl methacrylate) blends [J].
Cui, Liang ;
Ding, Yan ;
Li, Xue ;
Wang, Zhe ;
Han, Yanchun .
THIN SOLID FILMS, 2006, 515 (04) :2038-2048
[9]   Phase decomposition in polymer blend films cast on substrates patterned with self-assembled monolayers [J].
Cyganik, P ;
Bernasik, A ;
Budkowski, A ;
Bergues, B ;
Kowalski, K ;
Rysz, J ;
Lekki, J ;
Lekka, M .
VACUUM, 2001, 63 (1-2) :307-313
[10]   Binary blends of diblock copolymers as an effective route to multiple length scales in perfect directed self-assembly of diblock copolymer thin films [J].
Edwards, EW ;
Stoykovich, MP ;
Nealey, PF ;
Solak, HH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (01) :340-344